Inventor
HENCH JOHN J
US19 patents
⚠️ This page may combine multiple inventors who share the name “HENCH JOHN J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
6 patentsUS10324050B2Jun 18, 2019
Measurement system optimization for X-ray based metrology
KLA TENCOR CORP32 citations94
US10775323B2Sep 15, 2020
Full beam metrology for X-ray scatterometry systems
KLA TENCOR CORP19 citations93
US9518916B1Dec 13, 2016
Compressive sensing for metrology
KLA TENCOR CORP38 citations93
US9846132B2Dec 19, 2017
Small-angle scattering X-ray metrology systems and methods
KLA TENCOR CORP10 citations84
US7602509B1Oct 13, 2009
Method for selecting optical configuration for high-precision scatterometric measurement
KLA TENCOR CORP11 citations83
US10062157B2Aug 28, 2018
Compressive sensing for metrology
KLA TENCOR CORP1 citations51
KLA CORP
4 patentsUS11313816B2Apr 26, 2022
Full beam metrology for x-ray scatterometry systems
KLA CORP2 citations72
US12320763B2Jun 3, 2025
Full beam metrology for x-ray scatterometry systems
KLA CORP0 citations61
US12379668B2Aug 5, 2025
Methods and systems for measurement of semiconductor structures with multi-pass statistical optimization
KLA CORP0 citations41
US12449386B2Oct 21, 2025
Forward library based seeding for efficient X-ray scatterometry measurements
KLA CORP0 citations37
TOKYO ELECTRON LTD
2 patentsDZIURA THADDEUS G
2 patentsUS10325004B1Jun 18, 2019
Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology
DZIURA THADDEUS G11 citations82
US9310296B2Apr 12, 2016
Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology
DZIURA THADDEUS G4 citations71