Inventor

SHCHEGROV ANDREI V

US85 patents

⚠️ This page may combine multiple inventors who share the name “SHCHEGROV ANDREI V”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHCHEGROV ANDREI V

KLA TENCOR CORP

X-ray scatterometry metrology for high aspect ratio structures

Parametric profiling using optical spectroscopic systems

Systems and methods for combined x-ray reflectometry and photoelectron spectroscopy

Integrated use of model-based metrology and a process model

Measurement system optimization for X-ray based metrology

System, method and computer program product for combining raw data from multiple metrology tools

Model building and analysis engine for combined X-ray and optical metrology

Methods and apparatus for measuring semiconductor device overlay using X-ray metrology

Compac X-ray source for semiconductor metrology

Metrology tool with combined XRF and SAXS capabilities

Compressive sensing for metrology

High brightness liquid droplet X-ray source for semiconductor metrology

Overlay error detection

Optical metrology using targets with field enhancement elements

Differential methods and apparatus for metrology of semiconductor targets

Overlay metrology using multiple parameter configurations

Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction

Methods and apparatus for patterned wafer characterization

Metrology systems and methods for process control

Model based measurement systems with improved electromagnetic solver performance

Apparatus and method for optical metrology with optimized system parameters

Small-angle scattering X-ray metrology systems and methods

Measurement of multiple patterning parameters

Apparatus, techniques, and target designs for measuring semiconductor parameters

Measurement of multiple patterning parameters

Computationally efficient X-ray based overlay measurement

Spectral reflectometry for in-situ process monitoring and control

Confined illumination for small spot size metrology

On-device metrology

Combined x-ray and optical metrology

Multi-model metrology

Optical metrology tool equipped with modulated illumination sources

Semiconductor metrology based on hyperspectral imaging

Systems for providing illumination in optical metrology

Metrology tool with combined X-ray and optical scatterometers

Process robust overlay metrology based on optical scatterometry

Measurement of multiple patterning parameters

Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity

KLA TENCOR TECH CORP

Parametric profiling using optical spectroscopic systems

Parametric profiling using optical spectroscopic systems

Overlay error detection

Parametric profiling using optical spectroscopic systems to adjust processing parameter

Parametric profiling using optical spectroscopic systems

NOVALUX INC

System and method for driving semiconductor laser sources for displays

Frequency stabilized vertical extended cavity surface emitting lasers

Projection display apparatus, system, and method

KLA CORP

Pupil-plane beam scanning for metrology

Methods and systems for overlay measurement based on soft X-ray Scatterometry

ARASOR CORP

Manufacturable vertical extended cavity surface emitting laser arrays

KLA—TENCOR CORP

Signal response metrology for scatterometry based overlay measurements