Inventor

BANNA SAMER

US52 patents

⚠️ This page may combine multiple inventors who share the name “BANNA SAMER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BANNA SAMER

APPLIED MATERIALS INC

Inductively coupled plasma reactor having RF phase control and methods of use thereof

Extended and independent RF powered cathode substrate for extreme edge tunability

Inductively coupled plasma source with phase control

Adaptive chamber matching in advanced semiconductor process control

Predictive spatial digital design of experiment for advanced semiconductor process optimization and control

Plasma reactor with highly symmetrical four-fold gas injection

Multi-zone gas injection assembly with azimuthal and radial distribution control

Tunable gas delivery assembly with internal diffuser and angular injection

Method and apparatus for reducing radiation induced change in semiconductor structures

Adaptive chamber matching in advanced semiconductor process control

Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability

Electromagnetic dipole for plasma density tuning in a substrate processing chamber

Electrostatic chuck with concentric cooling base

Plasma reactor with uniform process rate distribution by improved RF ground return path

Gas hub for plasma reactor

Nozzle for multi-zone gas injection assembly

Predictive spatial digital design of experiment for advanced semiconductor process optimization and control

Multi-zone heated ESC with independent edge zones

Inductively coupled plasma apparatus

Adaptive control of wafer-to-wafer variability in device performance in advanced semiconductor processes

High efficiency triple-coil inductively coupled plasma source with phase control

Particle detection for substrate processing

Flexible mode scanning optical microscopy and inspection system

Embedded test structure for trimming process control

Plasma reactor with highly symmetrical four-fold gas injection

Methods for reducing etch nonuniformity in the presence of a weak magnetic field in an inductively coupled plasma reactor

Multiple zone coil antenna with plural radial lobes

Adaptive control of variability in device performance in advanced semiconductor processes

Semiconductor device packaging methods

High throughput compact microfluidic cell counter

High-resolution three-dimensional profiling of features in advanced semiconductor devices in a non-destructive manner using electron beam scanning electron microscopy

Use of electron beam scanning electron microscopy for characterization of a sidewall occluded from line-of-sight of the electron beam

Metrology system for substrate deformation measurement

Metrology systems with multiple derivative modules for substrate stress and deformation measurement

Particle detection for substrate processing

Side gas injection kit for multi-zone gas injection assembly

High efficiency inductively coupled plasma source with customized RF shield for plasma profile control

Adapting electrical, mechanical, and thermal properties of package substrates

Method and apparatus for reducing radiation induced change in semiconductor structures

Self-bias calculation on a substrate in a process chamber with bias power for single or multiple frequencies

Coil antenna with plural radial lobes

Automated closed system for cell therapy manufacturing

All-in-one bioreactor for therapeutic cells manufacturing

BANNA SAMER

Synchronous embedded radio frequency pulsing for plasma etching

Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system

LUBOMIRSKY DMITRY

Electrostatic chuck with advanced RF and temperature uniformity

RAMASWAMY KARTIK

Apparatus for VHF impedance match tuning

TODOROW VALENTIN N

Field enhanced inductively coupled plasma (Fe-ICP) reactor

TANTIWONG KYLE

Substrate support with advanced edge control provisions

ASM IP HOLDING BV

End effector