Inventor
WENG MING-HUI
TW35 patents
⚠️ This page may combine multiple inventors who share the name “WENG MING-HUI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
34 patentsUS11705332B2Jul 18, 2023
Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations85
US12159787B2Dec 3, 2024
Method of manufacturing a semiconductor device and pattern formation method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12057315B2Aug 6, 2024
Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12002675B2Jun 4, 2024
Photoresist layer outgassing prevention
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11822237B2Nov 21, 2023
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11456266B2Sep 27, 2022
Bump structure and method of manufacturing bump structure
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11079681B2Aug 3, 2021
Lithography method for positive tone development
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11022886B2Jun 1, 2021
Bottom-up material formation for planarization
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10866517B2Dec 15, 2020
Lithography techniques for reducing resist swelling
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10520822B2Dec 31, 2019
Lithography techniques for reducing resist swelling
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10083832B1Sep 25, 2018
Under layer composition and method of manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10032640B1Jul 24, 2018
Formation of semiconductor structure with a photoresist cross link and de-cross link process
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations72
US12222654B2Feb 11, 2025
Lithography method for positive tone development
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12476210B2Nov 18, 2025
Bump structure and method of manufacturing bump structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12463034B2Nov 4, 2025
Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12374548B2Jul 29, 2025
Photoresist layer outgassing prevention
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12222653B2Feb 11, 2025
Method for forming semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12222643B2Feb 11, 2025
Method of manufacturing a semiconductor device and pattern formation method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12135501B2Nov 5, 2024
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12025920B2Jul 2, 2024
Lithography techniques for reducing defects
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11923326B2Mar 5, 2024
Bump structure and method of manufacturing bump structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11694896B2Jul 4, 2023
Photoresist developer and method of developing photoresist
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11281107B2Mar 22, 2022
Method for performing lithography process with post treatment
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11143963B2Oct 12, 2021
Negative tone developer for extreme ultraviolet lithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11009796B2May 18, 2021
Method for forming semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10879108B2Dec 29, 2020
Topographic planarization method for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10866515B2Dec 15, 2020
Lithography process using photoresist material with photosensitive functional group
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10691023B2Jun 23, 2020
Method for performing lithography process with post treatment
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12271113B2Apr 8, 2025
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12272554B2Apr 8, 2025
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12074025B2Aug 27, 2024
Photoresist developer and method of developing photoresist
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11784046B2Oct 10, 2023
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10520820B2Dec 31, 2019
Negative tone developer for extreme ultraviolet lithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10520833B1Dec 31, 2019
Extreme ultraviolet lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52