Inventor
ZHANG HENAN
US24 patents
⚠️ This page may combine multiple inventors who share the name “ZHANG HENAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
12 patentsUS11424123B2Aug 23, 2022
Forming a semiconductor feature using atomic layer etch
TOKYO ELECTRON LTD1 citations62
US12148624B2Nov 19, 2024
Wet etch process and method to control fin height and channel area in a fin field effect transistor (FinFET)
TOKYO ELECTRON LTD0 citations59
US12100598B2Sep 24, 2024
Methods for planarizing a substrate using a combined wet etch and chemical mechanical polishing (CMP) process
TOKYO ELECTRON LTD1 citations59
US11289325B2Mar 29, 2022
Radiation of substrates during processing and systems thereof
TOKYO ELECTRON LTD0 citations59
US12243749B2Mar 4, 2025
Methods to provide uniform wet etching of material within high aspect ratio features provided on a patterned substrate
TOKYO ELECTRON LTD0 citations58
US12100599B2Sep 24, 2024
Wet etch process and method to provide uniform etching of material formed within features having different critical dimension (CD)
TOKYO ELECTRON LTD0 citations58
US11532517B2Dec 20, 2022
Localized etch stop layer
TOKYO ELECTRON LTD0 citations51
US12237216B2Feb 25, 2025
Method for filling recessed features in semiconductor devices with a low-resistivity metal
TOKYO ELECTRON LTD0 citations50
US12598747B2Apr 7, 2026
Fabricating three-dimensional semiconductor structures
TOKYO ELECTRON LTD0 citations49
US12482702B2Nov 25, 2025
Wet etch process and methods to form air gaps between metal interconnects
TOKYO ELECTRON LTD0 citations48
US12148625B2Nov 19, 2024
Methods to prevent surface charge induced cd-dependent etching of material formed within features on a patterned substrate
TOKYO ELECTRON LTD0 citations48
US12400872B2Aug 26, 2025
Sacrificial capping layer for gate protection
TOKYO ELECTRON LTD0 citations47
BEIJING BAIDU NETCOM SCI & TECH CO LTD
6 patentsUS11463631B2Oct 4, 2022
Method and apparatus for generating face image
BEIJING BAIDU NETCOM SCI & TECH CO LTD2 citations72
US11455765B2Sep 27, 2022
Method and apparatus for generating virtual avatar
BEIJING BAIDU NETCOM SCI & TECH CO LTD3 citations72
US11875601B2Jan 16, 2024
Meme generation method, electronic device and storage medium
BEIJING BAIDU NETCOM SCI & TECH CO LTD2 citations71
US11810310B2Nov 7, 2023
Satellite image processing method, network training method, related devices and electronic device
BEIJING BAIDU NETCOM SCI & TECH CO LTD0 citations51
US11748895B2Sep 5, 2023
Method and apparatus for processing video frame
BEIJING BAIDU NETCOM SCI & TECH CO LTD0 citations51
US11568590B2Jan 31, 2023
Cartoonlization processing method for image, electronic device, and storage medium
BEIJING BAIDU NETCOM SCI & TECH CO LTD0 citations51
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD
5 patentsUS10937672B2Mar 2, 2021
Heating device and heating chamber
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD1 citations59
US11315768B2Apr 26, 2022
Loading apparatus and physical vapor deposition apparatus
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD0 citations55
US10984994B2Apr 20, 2021
Deposition apparatus and physical vapor deposition chamber
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD0 citations49
US11710624B2Jul 25, 2023
Sputtering method
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD0 citations44
US11107706B2Aug 31, 2021
Gas phase etching device and gas phase etching apparatus
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD0 citations44