Inventor
SCHEUER JAY T
US21 patents
⚠️ This page may combine multiple inventors who share the name “SCHEUER JAY T”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
10 patentsUS11127557B1Sep 21, 2021
Ion source with single-slot tubular cathode
APPLIED MATERIALS INC5 citations72
US12154753B2Nov 26, 2024
Device to control uniformity of extracted ion beam
APPLIED MATERIALS INC0 citations62
US11810746B2Nov 7, 2023
Variable thickness ion source extraction plate
APPLIED MATERIALS INC0 citations62
US11437215B2Sep 6, 2022
Electrostatic filter providing reduced particle generation
APPLIED MATERIALS INC0 citations62
USD1051838SNov 19, 2024
Single-slot tubular cathode
APPLIED MATERIALS INC0 citations61
US11631567B2Apr 18, 2023
Ion source with single-slot tubular cathode
APPLIED MATERIALS INC0 citations61
US11562885B2Jan 24, 2023
Particle yield via beam-line pressure control
APPLIED MATERIALS INC0 citations59
US11651932B1May 16, 2023
Mismatched optics for angular control of extracted ion beam
APPLIED MATERIALS INC0 citations55
US10818469B2Oct 27, 2020
Cylindrical shaped arc chamber for indirectly heated cathode ion source
APPLIED MATERIALS INC0 citations52
US12191113B2Jan 7, 2025
Systems and methods for optimizing full horizontal scanned beam distance
APPLIED MATERIALS INC0 citations45
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC
7 patentsUS9685298B1Jun 20, 2017
Apparatus and method for contamination control in ion beam apparatus
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC13 citations84
US9805931B2Oct 31, 2017
Liquid immersion doping
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3 citations73
US9761410B2Sep 12, 2017
Apparatus and method for in-situ cleaning in ion beam apparatus
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC5 citations73
US10522330B2Dec 31, 2019
In-situ plasma cleaning of process chamber components
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3 citations71
US10410844B2Sep 10, 2019
RF clean system for electrostatic elements
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations71
US11495434B2Nov 8, 2022
In-situ plasma cleaning of process chamber components
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations61
US11037758B2Jun 15, 2021
In-situ plasma cleaning of process chamber components
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations61
VARIAN SEMICONDUCTOR EQUIPMENT
3 patentsUS7126808B2Oct 24, 2006
Wafer platen equipped with electrostatic clamp, wafer backside gas cooling, and high voltage operation capability for plasma doping
VARIAN SEMICONDUCTOR EQUIPMENT69 citations95
US6791097B2Sep 14, 2004
Adjustable conductance limiting aperture for ion implanters
VARIAN SEMICONDUCTOR EQUIPMENT19 citations92
US7878145B2Feb 1, 2011
Monitoring plasma ion implantation systems for fault detection and process control
VARIAN SEMICONDUCTOR EQUIPMENT7 citations80