Inventor

LIKHANSKII ALEXANDRE

US45 patents

⚠️ This page may combine multiple inventors who share the name “LIKHANSKII ALEXANDRE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIKHANSKII ALEXANDRE

APPLIED MATERIALS INC

Electrodynamic mass analysis with RF biased ion source

Ion source with biased extraction plate

Apparatus, system and techniques for mass analyzed ion beam

Apparatus and method for controlling ion beam properties using electrostatic filter

Shaped electrode

Ion source with single-slot tubular cathode

Plasma shaper to control ion flux distribution of plasma source

Device to control uniformity of extracted ion beam

Ion extraction assembly having variable electrode thickness for beam uniformity control

Variable thickness ion source extraction plate

Ion source with biased extraction plate

Electrostatic filter providing reduced particle generation

High-current ion implanter and method for controlling ion beam using high-current ion implanter

Single-slot tubular cathode

Ion source with single-slot tubular cathode

Electrostatic filter and ion implanter having asymmetric electrostatic configuration

Hybrid apparatus, system and techniques for mass analyzed ion beam

Mismatched optics for angular control of extracted ion beam

Apparatus for directional processing

Apparatus and method for controlling ion beam using electrostatic filter

Electostatic filter and method for controlling ion beam properties using electrostatic filter

Electostatic filter and method for controlling ion beam using electostatic filter

VARIAN SEMICONDUCTOR EQUIPMENT ASS INC

Electrodynamic mass analysis

Apparatus and method for contamination control in ion beam apparatus

Conductive beam optic containing internal heating element

Ion mass separation using RF extraction

High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture

Apparatus and method for in-situ cleaning in ion beam apparatus

Controlling contamination particle trajectory from a beam-line electrostatic element

Uniformity control using adjustable internal antennas

Multi-aperture extraction system for angled ion beam

Extreme edge uniformity control

Radio frequency extraction system for charge neutralized ion beam

In-situ plasma cleaning of process chamber components

RF clean system for electrostatic elements

Extreme edge uniformity control

Conductive beam optics for reducing particles in ion implanter

In-situ plasma cleaning of process chamber components

In-situ plasma cleaning of process chamber components

High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture

Ion beam uniformity control

Apparatus and method for improved ion beam current

Apparatus and method for multilayer deposition

VARIAN SEMICONDUCTOR EQUIPMENT

Ion beam uniformity control

BOEING CO

Systems and methods for controlling flows with electrical pulses