Inventor
HOLBER WILLIAM M
US38 patents
⚠️ This page may combine multiple inventors who share the name “HOLBER WILLIAM M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED SCIENCE & TECH INC
13 patentsUS6559408B2May 6, 2003
Toroidal low-field reactive gas source
APPLIED SCIENCE & TECH INC104 citations99
US6150628ANov 21, 2000
Toroidal low-field reactive gas source
APPLIED SCIENCE & TECH INC458 citations99
US6924455B1Aug 2, 2005
Integrated plasma chamber and inductively-coupled toroidal plasma source
APPLIED SCIENCE & TECH INC82 citations98
US6887339B1May 3, 2005
RF power supply with integrated matching network
APPLIED SCIENCE & TECH INC223 citations98
US6388226B1May 14, 2002
Toroidal low-field reactive gas source
APPLIED SCIENCE & TECH INC117 citations98
US6815633B1Nov 9, 2004
Inductively-coupled toroidal plasma source
APPLIED SCIENCE & TECH INC207 citations96
US6552296B2Apr 22, 2003
Toroidal low-field reactive gas source
APPLIED SCIENCE & TECH INC62 citations96
US6486431B1Nov 26, 2002
Toroidal low-field reactive gas source
APPLIED SCIENCE & TECH INC56 citations96
US6872909B2Mar 29, 2005
Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
APPLIED SCIENCE & TECH INC55 citations95
US5688382ANov 18, 1997
Microwave plasma deposition source and method of filling high aspect-ratio features on a substrate
APPLIED SCIENCE & TECH INC68 citations94
US6664497B2Dec 16, 2003
Toroidal low-field reactive gas source
APPLIED SCIENCE & TECH INC26 citations92
US5625259AApr 29, 1997
Microwave plasma applicator with a helical fluid cooling channel surrounding a microwave transparent discharge tube
APPLIED SCIENCE & TECH INC25 citations90
US5568015AOct 22, 1996
Fluid-cooled dielectric window for a plasma system
APPLIED SCIENCE & TECH INC18 citations71
MKS INSTR INC
11 patentsUS7764140B2Jul 27, 2010
Radio frequency power delivery system
MKS INSTR INC139 citations97
US7161112B2Jan 9, 2007
Toroidal low-field reactive gas source
MKS INSTR INC45 citations96
US7166816B1Jan 23, 2007
Inductively-coupled torodial plasma source
MKS INSTR INC56 citations94
US7569790B2Aug 4, 2009
Method and apparatus for processing metal bearing gases
MKS INSTR INC19 citations93
US7541558B2Jun 2, 2009
Inductively-coupled toroidal plasma source
MKS INSTR INC34 citations92
US8003935B2Aug 23, 2011
Chemical ionization reaction or proton transfer reaction mass spectrometry with a quadrupole mass spectrometer
MKS INSTR INC41 citations91
US7501600B2Mar 10, 2009
Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
MKS INSTR INC17 citations91
US7659489B2Feb 9, 2010
Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
MKS INSTR INC13 citations89
US8704171B2Apr 22, 2014
Chemical ionization reaction or proton transfer reaction mass spectrometry
MKS INSTR INC13 citations82
US8003936B2Aug 23, 2011
Chemical ionization reaction or proton transfer reaction mass spectrometry with a time-of-flight mass spectrometer
MKS INSTR INC9 citations82
US7238266B2Jul 3, 2007
Method and apparatus for fluorine generation and recirculation
MKS INSTR INC4 citations63
IBM
4 patentsUS5505816AApr 9, 1996
Etching of silicon dioxide selectively to silicon nitride and polysilicon
IBM328 citations98
US5302266AApr 12, 1994
Method and apparatus for filing high aspect patterns with metal
IBM119 citations95
US5263776ANov 23, 1993
Multi-wavelength optical thermometry
IBM40 citations93
US5208512AMay 4, 1993
Scanned electron cyclotron resonance plasma source
IBM34 citations92
HOLBER WILLIAM M
3 patentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC
3 patentsUS10522330B2Dec 31, 2019
In-situ plasma cleaning of process chamber components
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3 citations71
US11495434B2Nov 8, 2022
In-situ plasma cleaning of process chamber components
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations61
US11037758B2Jun 15, 2021
In-situ plasma cleaning of process chamber components
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations61