P

Inventor

CHEN YIHONG

US47 patents
⚠️ This page may combine multiple inventors who share the name “CHEN YIHONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

39 patents
US10319604B2Jun 11, 2019

Methods for self-aligned patterning

APPLIED MATERIALS INC20 citations94
US10636669B2Apr 28, 2020

Seam healing using high pressure anneal

APPLIED MATERIALS INC15 citations86
US10480074B2Nov 19, 2019

Apparatus for radical-based deposition of dielectric films

APPLIED MATERIALS INC15 citations85
US10886172B2Jan 5, 2021

Methods for wordline separation in 3D-NAND devices

APPLIED MATERIALS INC8 citations84
US10636659B2Apr 28, 2020

Selective deposition for simplified process flow of pillar formation

APPLIED MATERIALS INC7 citations84
US10622251B2Apr 14, 2020

Methods for wordline separation in 3D-NAND devices

APPLIED MATERIALS INC8 citations84
US10354916B2Jul 16, 2019

Methods for wordline separation in 3D-NAND devices

APPLIED MATERIALS INC12 citations84
US9508545B2Nov 29, 2016

Selectively lateral growth of silicon oxide thin film

APPLIED MATERIALS INC6 citations83
US11174551B2Nov 16, 2021

Methods for depositing tungsten on halosilane based metal silicide nucleation layers

APPLIED MATERIALS INC2 citations73
US10854511B2Dec 1, 2020

Methods of lowering wordline resistance

APPLIED MATERIALS INC2 citations73
US10559465B2Feb 11, 2020

Pre-treatment approach to improve continuity of ultra-thin amorphous silicon film on silicon oxide

APPLIED MATERIALS INC5 citations73
US10559497B2Feb 11, 2020

Seamless tungsten fill by tungsten oxidation-reduction

APPLIED MATERIALS INC2 citations73
US10276379B2Apr 30, 2019

Treatment approach to improve film roughness by improving nucleation/adhesion of silicon oxide

APPLIED MATERIALS INC2 citations73
US9978685B2May 22, 2018

Conformal amorphous silicon as nucleation layer for W ALD process

APPLIED MATERIALS INC4 citations73
US10468263B2Nov 5, 2019

Tungsten deposition without barrier layer

APPLIED MATERIALS INC4 citations72
US9840777B2Dec 12, 2017

Apparatus for radical-based deposition of dielectric films

APPLIED MATERIALS INC4 citations72
US9741558B2Aug 22, 2017

Selectively lateral growth of silicon oxide thin film

APPLIED MATERIALS INC3 citations72
US9384950B2Jul 5, 2016

Chamber coatings

APPLIED MATERIALS INC4 citations72
US11702742B2Jul 18, 2023

Methods of forming nucleation layers with halogenated silanes

APPLIED MATERIALS INC0 citations63
US11244824B2Feb 8, 2022

Conformal doped amorphous silicon as nucleation layer for metal deposition

APPLIED MATERIALS INC0 citations63
US11066743B2Jul 20, 2021

Selective atomic layer deposition of ruthenium

APPLIED MATERIALS INC0 citations63
US12394670B2Aug 19, 2025

Nucleation-free gap fill ALD process

APPLIED MATERIALS INC0 citations62
US11887856B2Jan 30, 2024

Enhanced spatial ALD of metals through controlled precursor mixing

APPLIED MATERIALS INC0 citations62
US11289374B2Mar 29, 2022

Nucleation-free gap fill ALD process

APPLIED MATERIALS INC1 citations62
US11094544B2Aug 17, 2021

Methods of forming self-aligned vias

APPLIED MATERIALS INC0 citations62
US11069568B2Jul 20, 2021

Ultra-thin diffusion barriers

APPLIED MATERIALS INC0 citations62
US11043386B2Jun 22, 2021

Enhanced spatial ALD of metals through controlled precursor mixing

APPLIED MATERIALS INC1 citations62
US10600684B2Mar 24, 2020

Ultra-thin diffusion barriers

APPLIED MATERIALS INC1 citations62
US12325910B2Jun 10, 2025

Deposition of conformal and gap-fill amorphous silicon thin-films

APPLIED MATERIALS INC0 citations52
US10790141B2Sep 29, 2020

Surface-selective atomic layer deposition using hydrosilylation passivation

APPLIED MATERIALS INC0 citations52
US10741435B2Aug 11, 2020

Oxidative volumetric expansion of metals and metal containing compounds

APPLIED MATERIALS INC0 citations52
US10615050B2Apr 7, 2020

Methods for gapfill in high aspect ratio structures

APPLIED MATERIALS INC0 citations52
US10410865B2Sep 10, 2019

Methods of forming self-aligned vias

APPLIED MATERIALS INC0 citations52
US10319624B2Jun 11, 2019

Oxidative volumetric expansion of metals and metal containing compounds

APPLIED MATERIALS INC0 citations52
US9613908B2Apr 4, 2017

Ultra-thin dielectric diffusion barrier and etch stop layer for advanced interconnect applications

APPLIED MATERIALS INC1 citations52
US10854461B2Dec 1, 2020

Tungsten deposition without barrier layer

APPLIED MATERIALS INC0 citations51
US10002757B2Jun 19, 2018

Selectively lateral growth of silicon oxide thin film

APPLIED MATERIALS INC0 citations51
US10784107B2Sep 22, 2020

Methods of forming tungsten pillars

APPLIED MATERIALS INC0 citations42
US9368448B2Jun 14, 2016

Metal-containing films as dielectric capping barrier for advanced interconnects

APPLIED MATERIALS INC0 citations42

VILLARRUEL FERNANDO X

3 patents

JDS UNIPHASE INC

1 patent

CHEN YIHONG

1 patent

KANAN MATTHEW W

1 patent

SUBBARAMAN HARISH

1 patent

UNIV ZHEJIANG

1 patent