Inventor
CHEN YIHONG
US47 patents
⚠️ This page may combine multiple inventors who share the name “CHEN YIHONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
39 patentsUS10319604B2Jun 11, 2019
Methods for self-aligned patterning
APPLIED MATERIALS INC20 citations94
US10636669B2Apr 28, 2020
Seam healing using high pressure anneal
APPLIED MATERIALS INC15 citations86
US10480074B2Nov 19, 2019
Apparatus for radical-based deposition of dielectric films
APPLIED MATERIALS INC15 citations85
US10886172B2Jan 5, 2021
Methods for wordline separation in 3D-NAND devices
APPLIED MATERIALS INC8 citations84
US10636659B2Apr 28, 2020
Selective deposition for simplified process flow of pillar formation
APPLIED MATERIALS INC7 citations84
US10622251B2Apr 14, 2020
Methods for wordline separation in 3D-NAND devices
APPLIED MATERIALS INC8 citations84
US10354916B2Jul 16, 2019
Methods for wordline separation in 3D-NAND devices
APPLIED MATERIALS INC12 citations84
US9508545B2Nov 29, 2016
Selectively lateral growth of silicon oxide thin film
APPLIED MATERIALS INC6 citations83
US11174551B2Nov 16, 2021
Methods for depositing tungsten on halosilane based metal silicide nucleation layers
APPLIED MATERIALS INC2 citations73
US10854511B2Dec 1, 2020
Methods of lowering wordline resistance
APPLIED MATERIALS INC2 citations73
US10559465B2Feb 11, 2020
Pre-treatment approach to improve continuity of ultra-thin amorphous silicon film on silicon oxide
APPLIED MATERIALS INC5 citations73
US10559497B2Feb 11, 2020
Seamless tungsten fill by tungsten oxidation-reduction
APPLIED MATERIALS INC2 citations73
US10276379B2Apr 30, 2019
Treatment approach to improve film roughness by improving nucleation/adhesion of silicon oxide
APPLIED MATERIALS INC2 citations73
US9978685B2May 22, 2018
Conformal amorphous silicon as nucleation layer for W ALD process
APPLIED MATERIALS INC4 citations73
US10468263B2Nov 5, 2019
Tungsten deposition without barrier layer
APPLIED MATERIALS INC4 citations72
US9840777B2Dec 12, 2017
Apparatus for radical-based deposition of dielectric films
APPLIED MATERIALS INC4 citations72
US9741558B2Aug 22, 2017
Selectively lateral growth of silicon oxide thin film
APPLIED MATERIALS INC3 citations72
US9384950B2Jul 5, 2016
Chamber coatings
APPLIED MATERIALS INC4 citations72
US11702742B2Jul 18, 2023
Methods of forming nucleation layers with halogenated silanes
APPLIED MATERIALS INC0 citations63
US11244824B2Feb 8, 2022
Conformal doped amorphous silicon as nucleation layer for metal deposition
APPLIED MATERIALS INC0 citations63
US11066743B2Jul 20, 2021
Selective atomic layer deposition of ruthenium
APPLIED MATERIALS INC0 citations63
US12394670B2Aug 19, 2025
Nucleation-free gap fill ALD process
APPLIED MATERIALS INC0 citations62
US11887856B2Jan 30, 2024
Enhanced spatial ALD of metals through controlled precursor mixing
APPLIED MATERIALS INC0 citations62
US11289374B2Mar 29, 2022
Nucleation-free gap fill ALD process
APPLIED MATERIALS INC1 citations62
US11094544B2Aug 17, 2021
Methods of forming self-aligned vias
APPLIED MATERIALS INC0 citations62
US11069568B2Jul 20, 2021
Ultra-thin diffusion barriers
APPLIED MATERIALS INC0 citations62
US11043386B2Jun 22, 2021
Enhanced spatial ALD of metals through controlled precursor mixing
APPLIED MATERIALS INC1 citations62
US10600684B2Mar 24, 2020
Ultra-thin diffusion barriers
APPLIED MATERIALS INC1 citations62
US12325910B2Jun 10, 2025
Deposition of conformal and gap-fill amorphous silicon thin-films
APPLIED MATERIALS INC0 citations52
US10790141B2Sep 29, 2020
Surface-selective atomic layer deposition using hydrosilylation passivation
APPLIED MATERIALS INC0 citations52
US10741435B2Aug 11, 2020
Oxidative volumetric expansion of metals and metal containing compounds
APPLIED MATERIALS INC0 citations52
US10615050B2Apr 7, 2020
Methods for gapfill in high aspect ratio structures
APPLIED MATERIALS INC0 citations52
US10410865B2Sep 10, 2019
Methods of forming self-aligned vias
APPLIED MATERIALS INC0 citations52
US10319624B2Jun 11, 2019
Oxidative volumetric expansion of metals and metal containing compounds
APPLIED MATERIALS INC0 citations52
US9613908B2Apr 4, 2017
Ultra-thin dielectric diffusion barrier and etch stop layer for advanced interconnect applications
APPLIED MATERIALS INC1 citations52
US10854461B2Dec 1, 2020
Tungsten deposition without barrier layer
APPLIED MATERIALS INC0 citations51
US10002757B2Jun 19, 2018
Selectively lateral growth of silicon oxide thin film
APPLIED MATERIALS INC0 citations51
US10784107B2Sep 22, 2020
Methods of forming tungsten pillars
APPLIED MATERIALS INC0 citations42
US9368448B2Jun 14, 2016
Metal-containing films as dielectric capping barrier for advanced interconnects
APPLIED MATERIALS INC0 citations42
VILLARRUEL FERNANDO X
3 patentsUS8265490B2Sep 11, 2012
Transamplifier, system and method for amplification of optical signals at plural wavelengths
VILLARRUEL FERNANDO X3 citations58
US8111992B2Feb 7, 2012
Amplified wavelength broadband video distribution architectures
VILLARRUEL FERNANDO X3 citations58
US7903980B2Mar 8, 2011
Amplified wavelength broadband video distribution architectures using a phase modulating waveguide
VILLARRUEL FERNANDO X4 citations58