Inventor
DUAN ZIQING
US35 patents
Patents
35 patentsUS10083834B2Sep 25, 2018
Methods of forming self-aligned vias
APPLIED MATERIALS INC64 citations98
US10319636B2Jun 11, 2019
Deposition and treatment of films for patterning
APPLIED MATERIALS INC21 citations94
US10319604B2Jun 11, 2019
Methods for self-aligned patterning
APPLIED MATERIALS INC20 citations94
US10886172B2Jan 5, 2021
Methods for wordline separation in 3D-NAND devices
APPLIED MATERIALS INC8 citations84
US10636659B2Apr 28, 2020
Selective deposition for simplified process flow of pillar formation
APPLIED MATERIALS INC7 citations84
US10622251B2Apr 14, 2020
Methods for wordline separation in 3D-NAND devices
APPLIED MATERIALS INC8 citations84
US10354916B2Jul 16, 2019
Methods for wordline separation in 3D-NAND devices
APPLIED MATERIALS INC12 citations84
US10192775B2Jan 29, 2019
Methods for gapfill in high aspect ratio structures
APPLIED MATERIALS INC7 citations84
US10418243B2Sep 17, 2019
Ultra-high modulus and etch selectivity boron-carbon hardmask films
APPLIED MATERIALS INC6 citations83
US9390910B2Jul 12, 2016
Gas flow profile modulated control of overlay in plasma CVD films
APPLIED MATERIALS INC5 citations83
US10854511B2Dec 1, 2020
Methods of lowering wordline resistance
APPLIED MATERIALS INC2 citations73
US10559497B2Feb 11, 2020
Seamless tungsten fill by tungsten oxidation-reduction
APPLIED MATERIALS INC2 citations73
US10403542B2Sep 3, 2019
Methods of forming self-aligned vias and air gaps
APPLIED MATERIALS INC4 citations73
US10319591B2Jun 11, 2019
Geometric control of bottom-up pillars for patterning applications
APPLIED MATERIALS INC3 citations73
US9711360B2Jul 18, 2017
Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system
APPLIED MATERIALS INC5 citations73
US11728168B2Aug 15, 2023
Ultra-high modulus and etch selectivity boron-carbon hardmask films
APPLIED MATERIALS INC2 citations72
US10410872B2Sep 10, 2019
Borane mediated dehydrogenation process from silane and alkylsilane species for spacer and hardmask application
APPLIED MATERIALS INC5 citations72
US10373822B2Aug 6, 2019
Gas flow profile modulated control of overlay in plasma CVD films
APPLIED MATERIALS INC2 citations72
US10100408B2Oct 16, 2018
Edge hump reduction faceplate by plasma modulation
APPLIED MATERIALS INC6 citations71
US12211694B2Jan 28, 2025
Ultra-high modulus and etch selectivity boron-carbon hardmask films
APPLIED MATERIALS INC0 citations62
US11488856B2Nov 1, 2022
Methods for gapfill in high aspect ratio structures
APPLIED MATERIALS INC0 citations62
US11094544B2Aug 17, 2021
Methods of forming self-aligned vias
APPLIED MATERIALS INC0 citations62
US10971364B2Apr 6, 2021
Ultra-high modulus and etch selectivity boron carbon hardmask films
APPLIED MATERIALS INC0 citations62
US10930475B2Feb 23, 2021
Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
APPLIED MATERIALS INC0 citations62
US10930503B2Feb 23, 2021
Geometric control of bottom-up pillars for patterning applications
APPLIED MATERIALS INC0 citations62
US10840186B2Nov 17, 2020
Methods of forming self-aligned vias and air gaps
APPLIED MATERIALS INC1 citations62
US9837265B2Dec 5, 2017
Gas flow profile modulated control of overlay in plasma CVD films
APPLIED MATERIALS INC1 citations62
US11011371B2May 18, 2021
SiBN film for conformal hermetic dielectric encapsulation without direct RF exposure to underlying structure material
APPLIED MATERIALS INC0 citations61
US10811303B2Oct 20, 2020
Methods for gapfill in high aspect ratio structures
APPLIED MATERIALS INC0 citations52
US10770349B2Sep 8, 2020
Critical dimension control for self-aligned contact patterning
APPLIED MATERIALS INC0 citations52
US10699952B2Jun 30, 2020
Deposition and treatment of films for patterning
APPLIED MATERIALS INC0 citations52
US10490411B2Nov 26, 2019
Method for enabling self-aligned lithography on metal contacts and selective deposition using free-standing vertical carbon structures
APPLIED MATERIALS INC0 citations52
US10410865B2Sep 10, 2019
Methods of forming self-aligned vias
APPLIED MATERIALS INC0 citations52
US10128088B2Nov 13, 2018
Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
APPLIED MATERIALS INC0 citations52
US10784107B2Sep 22, 2020
Methods of forming tungsten pillars
APPLIED MATERIALS INC0 citations42