Inventor

MALLICK ABHIJIT BASU

US202 patents

⚠️ This page may combine multiple inventors who share the name “MALLICK ABHIJIT BASU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MALLICK ABHIJIT BASU

APPLIED MATERIALS INC

Low temperature silicon nitride films using remote plasma CVD technology

Method and system for improving dielectric film quality for void free gap fill

Methods of forming self-aligned vias

Flowable gapfill using solvents

Development of high etch selective hardmask material by ion implantation into amorphous carbon films

Flowable low-k dielectric gapfill treatment

Methods for forming a silicon oxide layer over a substrate

High quality silicon oxide films by remote plasma CVD from disilane precursors

Curing methods for silicon dioxide multi-layers

Curing methods for silicon dioxide thin films deposited from alkoxysilane precursor with harp II process

Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes

Dry stripping of boron carbide hardmask

Thermal silicon etch

Deposition and treatment of films for patterning

Methods for self-aligned patterning

Flowable films using alternative silicon precursors

Seam healing using high pressure anneal

Apparatus for radical-based deposition of dielectric films

Methods for wordline separation in 3D-NAND devices

3D NAND etch

Diamond-like carbon film

Selective deposition for simplified process flow of pillar formation

Methods for wordline separation in 3D-NAND devices

Two-step process for gapfilling high aspect ratio trenches with amorphous silicon film

CVD based oxide-metal multi structure for 3D NAND memory devices

Methods for wordline separation in 3D-NAND devices

Processing system containing an isolation region separating a deposition chamber from a treatment chamber

Methods for gapfill in high aspect ratio structures

Silicide films through selective deposition

Selectively lateral growth of silicon oxide thin film

Low cost flowable dielectric films

Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor

Molecular layer deposition of silicon carbide

High density carbon films for patterning applications

Carbon hard masks for patterning applications and methods related thereto

Method for Si gap fill by PECVD

High-density low temperature carbon films for hardmask and other patterning applications

Diamond-like carbon as mandrel

Graphene diffusion barrier

Multicolor approach to DRAM STI active cut patterning

WANG LINLIN

Capping layer for reduced outgassing

In-situ ozone cure for radical-component CVD

Wet oxidation process performed on a dielectric material formed from a flowable CVD process

MALLICK ABHIJIT BASU

High quality silicon oxide films by remote plasma CVD from disilane precursors

Air gap formation

APPLIED MAT

Flowable carbon for semiconductor processing

WEIDMAN TIMOTHY W

Radiation patternable CVD film

SAPRE KEDAR

Silicon-selective dry etch for carbon-containing films

MICROMATERIALS LLC

Fully self-aligned via

INGLE NITIN

Oxygen-doping for non-carbon radical-component CVD films