Inventor
IKEDA KIMI
JP17 patents
⚠️ This page may combine multiple inventors who share the name “IKEDA KIMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
8 patentsUS8728712B2May 20, 2014
Polymerizable composition
FUJIFILM CORP7 citations83
US8735483B2May 27, 2014
Polymerizable composition
FUJIFILM CORP8 citations82
US12372397B2Jul 29, 2025
Ultraviolet-sensing member, microcapsule, production method of microcapsule, dispersion liquid for forming ultraviolet-sensing layer, and ultraviolet-sensing kit
FUJIFILM CORP0 citations61
US12540848B2Feb 3, 2026
Ultraviolet inspection tool, ultraviolet inspection kit, and ultraviolet inspection method
FUJIFILM CORP0 citations59
US7300738B2Nov 27, 2007
Azolinyl acetic acid derivative and azolinyl acetic acid derivative containing recording material
FUJIFILM CORP0 citations51
US12436096B2Oct 7, 2025
Ultraviolet inspection tool and inspection method using a visual indicator
FUJIFILM CORP0 citations50
US9389507B2Jul 12, 2016
Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition
FUJIFILM CORP1 citations50
US9776447B2Oct 3, 2017
Inkjet recording sheet, method for manufacturing inkjet recording sheet, printed article, method for manufacturing printed article, and ornamental glass
FUJIFILM CORP0 citations38
FUJI PHOTO FILM CO LTD
7 patentsUS5958668ASep 28, 1999
Recording material
FUJI PHOTO FILM CO LTD68 citations96
US6022664AFeb 8, 2000
Light and heat sensitive recording material
FUJI PHOTO FILM CO LTD21 citations92
US6348433B1Feb 19, 2002
Diazo compound and heat-sensitive recording material
FUJI PHOTO FILM CO LTD4 citations62
US6703345B2Mar 9, 2004
Diazonium salt and heat-sensitive recording material
FUJI PHOTO FILM CO LTD1 citations50
US6835692B2Dec 28, 2004
Heat-sensitive recording material containing oxonol dye
FUJI PHOTO FILM CO LTD0 citations49
US6720421B2Apr 13, 2004
Phenylurethane compounds and methods for producing same, asymmetric urea compounds and methods for producing same, barbituric acid derivative, and diazo thermal recording material containing the derivative
FUJI PHOTO FILM CO LTD0 citations47
US6268104B1Jul 31, 2001
Heat-sensitive recording material comprising a uracil coupling component
FUJI PHOTO FILM CO LTD0 citations41