Inventor
ISHIKAWA KIYOSHI
JP42 patents
⚠️ This page may combine multiple inventors who share the name “ISHIKAWA KIYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
19 patentsUS5902713AMay 11, 1999
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD23 citations92
US5756255AMay 26, 1998
Undercoating composition for photolithography
TOKYO OHKA KOGYO CO LTD38 citations92
US5700625ADec 23, 1997
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD22 citations92
US6042988AMar 28, 2000
Chemical-amplification-type negative resist composition
TOKYO OHKA KOGYO CO LTD20 citations90
US5955241ASep 21, 1999
Chemical-amplification-type negative resist composition and method for forming negative resist pattern
TOKYO OHKA KOGYO CO LTD19 citations84
US6087068AJul 11, 2000
Undercoating composition for photolithographic resist
TOKYO OHKA KOGYO CO LTD13 citations74
US6083665AJul 4, 2000
Photoresist laminate and method for patterning using the same
TOKYO OHKA KOGYO CO LTD11 citations74
US5928837AJul 27, 1999
Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds
TOKYO OHKA KOGYO CO LTD14 citations74
US5925495AJul 20, 1999
Photoresist laminate and method for patterning using the same
TOKYO OHKA KOGYO CO LTD15 citations74
US5908738AJun 1, 1999
Undercoating composition for photolithography
TOKYO OHKA KOGYO CO LTD15 citations74
US5789136AAug 4, 1998
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD9 citations74
US7932013B2Apr 26, 2011
Pattern coating material and pattern forming method
TOKYO OHKA KOGYO CO LTD3 citations62
US9405199B2Aug 2, 2016
Method for forming resist pattern
TOKYO OHKA KOGYO CO LTD2 citations61
US7449276B2Nov 11, 2008
Positive photoresist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD2 citations61
US7524604B2Apr 28, 2009
Positive resist composition and method of formation of resist patterns
TOKYO OHKA KOGYO CO LTD2 citations60
US6153354ANov 28, 2000
Electron beam negative working resist composition
TOKYO OHKA KOGYO CO LTD4 citations60
US8043798B2Oct 25, 2011
Method of forming fine patterns
TOKYO OHKA KOGYO CO LTD0 citations52
US9868090B2Jan 16, 2018
Process for preparing chemical liquid of silylating agent and surface treatment method
TOKYO OHKA KOGYO CO LTD0 citations50
US7727701B2Jun 1, 2010
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations40
FUJITSU LTD
4 patentsUS8378863B2Feb 19, 2013
Analog-to-digital converter and correction method thereof
FUJITSU LTD25 citations92
US7183491B2Feb 27, 2007
Printed wiring board with improved impedance matching
FUJITSU LTD7 citations74
US8035542B2Oct 11, 2011
Digital-to-analog converter and successive approximation type analog-to-digital converter including the same
FUJITSU LTD5 citations63
US7969343B2Jun 28, 2011
Successive approximation analog-digital converter circuit using capacitance array
FUJITSU LTD4 citations63