P

Inventor

ISHIKAWA KIYOSHI

JP42 patents
⚠️ This page may combine multiple inventors who share the name “ISHIKAWA KIYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

19 patents
US5902713AMay 11, 1999

Chemical-sensitization photoresist composition

TOKYO OHKA KOGYO CO LTD23 citations92
US5756255AMay 26, 1998

Undercoating composition for photolithography

TOKYO OHKA KOGYO CO LTD38 citations92
US5700625ADec 23, 1997

Negative-working photoresist composition

TOKYO OHKA KOGYO CO LTD22 citations92
US6042988AMar 28, 2000

Chemical-amplification-type negative resist composition

TOKYO OHKA KOGYO CO LTD20 citations90
US5955241ASep 21, 1999

Chemical-amplification-type negative resist composition and method for forming negative resist pattern

TOKYO OHKA KOGYO CO LTD19 citations84
US6087068AJul 11, 2000

Undercoating composition for photolithographic resist

TOKYO OHKA KOGYO CO LTD13 citations74
US6083665AJul 4, 2000

Photoresist laminate and method for patterning using the same

TOKYO OHKA KOGYO CO LTD11 citations74
US5928837AJul 27, 1999

Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds

TOKYO OHKA KOGYO CO LTD14 citations74
US5925495AJul 20, 1999

Photoresist laminate and method for patterning using the same

TOKYO OHKA KOGYO CO LTD15 citations74
US5908738AJun 1, 1999

Undercoating composition for photolithography

TOKYO OHKA KOGYO CO LTD15 citations74
US5789136AAug 4, 1998

Negative-working photoresist composition

TOKYO OHKA KOGYO CO LTD9 citations74
US7932013B2Apr 26, 2011

Pattern coating material and pattern forming method

TOKYO OHKA KOGYO CO LTD3 citations62
US9405199B2Aug 2, 2016

Method for forming resist pattern

TOKYO OHKA KOGYO CO LTD2 citations61
US7449276B2Nov 11, 2008

Positive photoresist composition and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD2 citations61
US7524604B2Apr 28, 2009

Positive resist composition and method of formation of resist patterns

TOKYO OHKA KOGYO CO LTD2 citations60
US6153354ANov 28, 2000

Electron beam negative working resist composition

TOKYO OHKA KOGYO CO LTD4 citations60
US8043798B2Oct 25, 2011

Method of forming fine patterns

TOKYO OHKA KOGYO CO LTD0 citations52
US9868090B2Jan 16, 2018

Process for preparing chemical liquid of silylating agent and surface treatment method

TOKYO OHKA KOGYO CO LTD0 citations50
US7727701B2Jun 1, 2010

Positive resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations40

FUJITSU LTD

4 patents

MITSUBISHI ELECTRIC CORP

2 patents

FUJI XEROX CO LTD

2 patents

RENESAS ELECTRONICS CORP

2 patents

CANON KK

1 patent

TOKYO OHKA KOGYA CO LTD

1 patent

TOSHIBA KK

1 patent

XEROX CORP

1 patent

UNIV PRINCETON

1 patent

ISHIKAWA KIYOSHI

1 patent

FUJITSU SEMICONDUCTOR LTD

1 patent

ISHIKAWA AKIKO

1 patent

AKIKO ISHIKAWA

1 patent

HAPPER WILLIAM

1 patent

RANK XEROX LTD

1 patent

NAKAMURA TSUYOSHI

1 patent

YAMADAYA TOKONORI

1 patent