P

Inventor

KUZUHARA MASAAKI

JP25 patents
⚠️ This page may combine multiple inventors who share the name “KUZUHARA MASAAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NEC CORP

23 patents
US6492669B2Dec 10, 2002

Semiconductor device with schottky electrode having high schottky barrier

NEC CORP134 citations98
US6465814B2Oct 15, 2002

Semiconductor device

NEC CORP104 citations98
US6100571AAug 8, 2000

Fet having non-overlapping field control electrode between gate and drain

NEC CORP151 citations97
US6765241B2Jul 20, 2004

Group III nitride semiconductor device of field effect transistor type having reduced parasitic capacitances

NEC CORP54 citations96
US6552373B2Apr 22, 2003

Hetero-junction field effect transistor having an intermediate layer

NEC CORP65 citations96
US5504353AApr 2, 1996

Field effect transistor

NEC CORP73 citations96
US7973335B2Jul 5, 2011

Field-effect transistor having group III nitride electrode structure

NEC CORP33 citations93
US7256432B2Aug 14, 2007

Field-effect transistor

NEC CORP25 citations93
US7859014B2Dec 28, 2010

Semiconductor device

NEC CORP46 citations92
US6534790B2Mar 18, 2003

Compound semiconductor field effect transistor

NEC CORP28 citations92
US6440822B1Aug 27, 2002

Method of manufacturing semiconductor device with sidewall metal layers

NEC CORP19 citations92
US6441391B1Aug 27, 2002

Semiconductor device having drain and gate electrodes formed to lie along few degrees of direction in relation to the substrate

NEC CORP52 citations92
US5596211AJan 21, 1997

Field effect transistor having a graded bandgap InGaAsP channel formed of a two-dimensional electron gas

NEC CORP22 citations92
US7071526B2Jul 4, 2006

Semiconductor device having Schottky junction electrode

NEC CORP13 citations84
US6255673B1Jul 3, 2001

Hetero-junction field effect transistor

NEC CORP10 citations74
US5453631ASep 26, 1995

Field effect transistor having a multi-layer channel

NEC CORP13 citations74
US5373168ADec 13, 1994

Two-dimensional electron gas field effect transistor including an improved InGaAs channel layer

NEC CORP18 citations74
US7323783B2Jan 29, 2008

Electrode, method for producing same and semiconductor device using same

NEC CORP2 citations63
US5466955ANov 14, 1995

Field effect transistor having an improved transistor characteristic

NEC CORP4 citations63
US5138405AAug 11, 1992

Quasi one-dimensional electron gas field effect transistor

NEC CORP3 citations63
US7459788B2Dec 2, 2008

Ohmic electrode structure of nitride semiconductor device

NEC CORP2 citations62
US5272372ADec 21, 1993

High speed non-volatile programmable read only memory device fabricated by using selective doping technology

NEC CORP5 citations61
US7615868B2Nov 10, 2009

Electrode, method for producing same and semiconductor device using same

NEC CORP1 citations52

NEC COMPOUND SEMICONDUCTOR

1 patent

HASHIMOTO SHIN

1 patent