Inventor
TAKEDA NAOSHIGE
JP6 patents
Patents
6 patentsUS5449584ASep 12, 1995
Positive photo-sensitive resin composition comprising a photosensitive polybenzoxazole or a mixture of a polybenzoxazole, an organic solvent soluble polymer and a diazoquinone and/or a dihydropyridine compound
SUMITOMO BAKELITE CO80 citations94
US6235436B1May 22, 2001
Semiconductor device using positive photosensitive resin composition and process for preparation thereof
SUMITOMO BAKELITE CO24 citations92
US6071666AJun 6, 2000
Positive type photosensitive resin composition and semiconductor device using the same
SUMITOMO BAKELITE CO44 citations92
US5756260AMay 26, 1998
Photosensitive polyimide resin composition containing a stabilizer and method for formation of relief pattern using same
SUMITOMO BAKELITE CO22 citations91
US5206337AApr 27, 1993
Solvent-soluble polyimidesiloxane oligomer and process for producing the same
SUMITOMO BAKELITE CO38 citations90
US5648451AJul 15, 1997
Process for producing photosensitive resin
SUMITOMO BAKELITE CO11 citations72