Inventor
TOKOH AKIRA
JP4 patents
Patents
4 patentsUS5449584ASep 12, 1995
Positive photo-sensitive resin composition comprising a photosensitive polybenzoxazole or a mixture of a polybenzoxazole, an organic solvent soluble polymer and a diazoquinone and/or a dihydropyridine compound
SUMITOMO BAKELITE CO80 citations94
US5385808AJan 31, 1995
Photosensitive resin composition and semiconductor apparatus using it
SUMITOMO BAKELITE CO21 citations91
US5206337AApr 27, 1993
Solvent-soluble polyimidesiloxane oligomer and process for producing the same
SUMITOMO BAKELITE CO38 citations90
US5238784AAug 24, 1993
Photosensitive resin composition with polyamic acid polymer
SUMITOMO BAKELITE CO20 citations80