Inventor

UEMA KENYU

JP2 patents

Patents

2 patents

US4291231ASep 22, 1981

Electron beam exposure system and an apparatus for carrying out the same

FUJITSU LTD22 citations80

US4413186ANov 1, 1983

Method for detecting a position of a micro-mark on a substrate by using an electron beam

FUJITSU LTD26 citations75