Inventor
KOBAYASHI MAIKO
JP5 patents
Patents
5 patentsUS5616401AApr 1, 1997
Oxynitride film and its formation method, and method for forming an element isolation oxide film using the oxynitride film
MITSUBISHI ELECTRIC CORP34 citations91
US5538916AJul 23, 1996
Method of manufacturing semiconductor device isolation region
MITSUBISHI ELECTRIC CORP54 citations91
US5956600ASep 21, 1999
Method of manufacturing a semiconductor device
MITSUBISHI ELECTRIC CORP13 citations72
US5688701ANov 18, 1997
Method of making semiconductor device having a plurality of impurity layers
MITSUBISHI ELECTRIC CORP6 citations72
US5543647AAug 6, 1996
Semiconductor device having a plurality of impurity layers
MITSUBISHI ELECTRIC CORP12 citations72