Inventor
UENO TAKUMI
JP37 patents
⚠️ This page may combine multiple inventors who share the name “UENO TAKUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
19 patentsUS6627997B1Sep 30, 2003
Semiconductor module and method of mounting
HITACHI LTD124 citations98
US6097100AAug 1, 2000
Resin sealed semiconductor devices and a process for manufacturing the same
HITACHI LTD56 citations94
US6924971B2Aug 2, 2005
High dielectric constant composite material and multilayer wiring board using the same
HITACHI LTD19 citations93
US6784541B2Aug 31, 2004
Semiconductor module and mounting method for same
HITACHI LTD37 citations93
US6638352B2Oct 28, 2003
Thermal stable low elastic modulus material and device using the same
HITACHI LTD31 citations92
US6579623B2Jun 17, 2003
Composite material member for semiconductor device and insulated and non-insulated semiconductor devices using composite material member
HITACHI LTD20 citations92
US6433440B1Aug 13, 2002
Semiconductor device having a porous buffer layer for semiconductor device
HITACHI LTD24 citations92
US6396145B1May 28, 2002
Semiconductor device and method for manufacturing the same technical field
HITACHI LTD38 citations92
US6348741B1Feb 19, 2002
Semiconductor apparatus and a manufacturing method thereof
HITACHI LTD25 citations92
US4722881AFeb 2, 1988
Radiation-sensitive resist composition with an admixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane
HITACHI LTD49 citations92
US5858584AJan 12, 1999
Positive photosensitive resin composition and electronic apparatus using the same
HITACHI LTD29 citations91
US5441849AAug 15, 1995
Method of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layer
HITACHI LTD30 citations91
US4835089AMay 30, 1989
Resist pattern forming process with dry etching
HITACHI LTD22 citations81
US5118582AJun 2, 1992
Pattern forming material and process for forming pattern using the same
HITACHI LTD19 citations78
US7220481B2May 22, 2007
High dielectric constant composite material and multilayer wiring board using the same
HITACHI LTD8 citations74
US4985344AJan 15, 1991
Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer
HITACHI LTD14 citations73
US4465768AAug 14, 1984
Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate
HITACHI LTD15 citations73
US6638631B2Oct 28, 2003
Thermal stable low elastic modulus material and device using the same
HITACHI LTD0 citations52
US5470996ANov 28, 1995
Pattern forming material and process for forming pattern using the same
HITACHI LTD1 citations48
RENESAS TECH CORP
6 patentsUS6940162B2Sep 6, 2005
Semiconductor module and mounting method for same
RENESAS TECH CORP23 citations93
US6888230B1May 3, 2005
Semiconductor device, semiconductor wafer, semiconductor module, and a method of manufacturing semiconductor device
RENESAS TECH CORP16 citations92
US6710263B2Mar 23, 2004
Semiconductor devices
RENESAS TECH CORP33 citations92
US6710446B2Mar 23, 2004
Semiconductor device comprising stress relaxation layers and method for manufacturing the same
RENESAS TECH CORP44 citations92
US7217992B2May 15, 2007
Semiconductor device, semiconductor wafer, semiconductor module, and a method of manufacturing semiconductor device
RENESAS TECH CORP3 citations63
US7038325B2May 2, 2006
Wiring tape for semiconductor device including a buffer layer having interconnected foams
RENESAS TECH CORP3 citations63
MATSUTANI HIROSHI
3 patentsUS8426985B2Apr 23, 2013
Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component
MATSUTANI HIROSHI9 citations80
US8461699B2Jun 11, 2013
Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
MATSUTANI HIROSHI3 citations58
US9786576B2Oct 10, 2017
Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device
MATSUTANI HIROSHI1 citations48
HITACHI CHEM DUPONT MICROSYS
2 patentsUS7150947B2Dec 19, 2006
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
HITACHI CHEM DUPONT MICROSYS12 citations82
US7851128B2Dec 14, 2010
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
HITACHI CHEM DUPONT MICROSYS3 citations60