P

Inventor

UENO TAKUMI

JP37 patents
⚠️ This page may combine multiple inventors who share the name “UENO TAKUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

19 patents
US6627997B1Sep 30, 2003

Semiconductor module and method of mounting

HITACHI LTD124 citations98
US6097100AAug 1, 2000

Resin sealed semiconductor devices and a process for manufacturing the same

HITACHI LTD56 citations94
US6924971B2Aug 2, 2005

High dielectric constant composite material and multilayer wiring board using the same

HITACHI LTD19 citations93
US6784541B2Aug 31, 2004

Semiconductor module and mounting method for same

HITACHI LTD37 citations93
US6638352B2Oct 28, 2003

Thermal stable low elastic modulus material and device using the same

HITACHI LTD31 citations92
US6579623B2Jun 17, 2003

Composite material member for semiconductor device and insulated and non-insulated semiconductor devices using composite material member

HITACHI LTD20 citations92
US6433440B1Aug 13, 2002

Semiconductor device having a porous buffer layer for semiconductor device

HITACHI LTD24 citations92
US6396145B1May 28, 2002

Semiconductor device and method for manufacturing the same technical field

HITACHI LTD38 citations92
US6348741B1Feb 19, 2002

Semiconductor apparatus and a manufacturing method thereof

HITACHI LTD25 citations92
US4722881AFeb 2, 1988

Radiation-sensitive resist composition with an admixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane

HITACHI LTD49 citations92
US5858584AJan 12, 1999

Positive photosensitive resin composition and electronic apparatus using the same

HITACHI LTD29 citations91
US5441849AAug 15, 1995

Method of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layer

HITACHI LTD30 citations91
US4835089AMay 30, 1989

Resist pattern forming process with dry etching

HITACHI LTD22 citations81
US5118582AJun 2, 1992

Pattern forming material and process for forming pattern using the same

HITACHI LTD19 citations78
US7220481B2May 22, 2007

High dielectric constant composite material and multilayer wiring board using the same

HITACHI LTD8 citations74
US4985344AJan 15, 1991

Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer

HITACHI LTD14 citations73
US4465768AAug 14, 1984

Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate

HITACHI LTD15 citations73
US6638631B2Oct 28, 2003

Thermal stable low elastic modulus material and device using the same

HITACHI LTD0 citations52
US5470996ANov 28, 1995

Pattern forming material and process for forming pattern using the same

HITACHI LTD1 citations48

RENESAS TECH CORP

6 patents

MATSUTANI HIROSHI

3 patents

HITACHI CHEM DUPONT MICROSYS

2 patents

OOE MASAYUKI

2 patents

HITICHI LTD

1 patent

HITACHI CHEMICAL CO LTD

1 patent

NAKANO HAJIME

1 patent

NUNOMURA MASATAKA

1 patent

TANIMOTO AKITOSHI

1 patent