Inventor
ALLISON WILLIAM C
US33 patents
⚠️ This page may combine multiple inventors who share the name “ALLISON WILLIAM C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NEXPLANAR CORP
9 patentsUS9649742B2May 16, 2017
Polishing pad having polishing surface with continuous protrusions
NEXPLANAR CORP13 citations82
US10160092B2Dec 25, 2018
Polishing pad having polishing surface with continuous protrusions having tapered sidewalls
NEXPLANAR CORP5 citations71
US10946495B2Mar 16, 2021
Low density polishing pad
NEXPLANAR CORP0 citations62
US9597770B2Mar 21, 2017
Method of fabricating a polishing
NEXPLANAR CORP0 citations52
US9931729B2Apr 3, 2018
Polishing pad with grooved foundation layer and polishing surface layer
NEXPLANAR CORP0 citations51
US9931728B2Apr 3, 2018
Polishing pad with foundation layer and polishing surface layer
NEXPLANAR CORP0 citations51
US9597777B2Mar 21, 2017
Homogeneous polishing pad for eddy current end-point detection
NEXPLANAR CORP0 citations51
US9555518B2Jan 31, 2017
Polishing pad with multi-modal distribution of pore diameters
NEXPLANAR CORP0 citations51
US10293459B2May 21, 2019
Polishing pad having polishing surface with continuous protrusions
NEXPLANAR CORP0 citations50
ALLISON WILLIAM C
7 patentsUS9067297B2Jun 30, 2015
Polishing pad with foundation layer and polishing surface layer
ALLISON WILLIAM C31 citations93
US9211628B2Dec 15, 2015
Polishing pad with concentric or approximately concentric polygon groove pattern
ALLISON WILLIAM C21 citations92
US8920219B2Dec 30, 2014
Polishing pad with alignment aperture
ALLISON WILLIAM C13 citations84
US8439994B2May 14, 2013
Method of fabricating a polishing pad with an end-point detection region for eddy current end-point detection
ALLISON WILLIAM C8 citations83
US8628384B2Jan 14, 2014
Polishing pad for eddy current end-point detection
ALLISON WILLIAM C3 citations61
US9028302B2May 12, 2015
Polishing pad for eddy current end-point detection
ALLISON WILLIAM C0 citations51
US8657653B2Feb 25, 2014
Homogeneous polishing pad for eddy current end-point detection
ALLISON WILLIAM C1 citations51
PPG IND OHIO INC
5 patentsUS7291063B2Nov 6, 2007
Polyurethane urea polishing pad
PPG IND OHIO INC29 citations92
US6905402B2Jun 14, 2005
Polishing pad for planarization
PPG IND OHIO INC33 citations92
US6074761AJun 13, 2000
Inkjet printing media
PPG IND OHIO INC16 citations92
US5948396ASep 7, 1999
Hair fixative amphoteric polymer composition
PPG IND OHIO INC21 citations92
US7097549B2Aug 29, 2006
Polishing pad
PPG IND OHIO INC9 citations73
LEFEVRE PAUL ANDRE
3 patentsUS9067298B2Jun 30, 2015
Polishing pad with grooved foundation layer and polishing surface layer
LEFEVRE PAUL ANDRE21 citations90
US9238294B2Jan 19, 2016
Polishing pad having porogens with liquid filler
LEFEVRE PAUL ANDRE5 citations71
US9597769B2Mar 21, 2017
Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer
LEFEVRE PAUL ANDRE2 citations70