Inventor
HIGASHIKAWA IWAO
JP28 patents
⚠️ This page may combine multiple inventors who share the name “HIGASHIKAWA IWAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
24 patentsUS6333138B1Dec 25, 2001
Exposure method utilizing partial exposure stitch area
TOSHIBA KK76 citations96
US5969428AOct 19, 1999
Alignment mark, manufacturing method thereof, exposing method using the alignment mark, semiconductor device manufactured using the exposing method
TOSHIBA KK43 citations96
US5847468ADec 8, 1998
Alignment mark for use in making semiconductor devices
TOSHIBA KK43 citations96
US5851842ADec 22, 1998
Measurement system and measurement method
TOSHIBA KK86 citations94
US6765673B1Jul 20, 2004
Pattern forming method and light exposure apparatus
TOSHIBA KK42 citations92
US6340542B1Jan 22, 2002
Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask
TOSHIBA KK36 citations92
US6333493B1Dec 25, 2001
Heat treating method and heat treating apparatus
TOSHIBA KK20 citations92
US6265696B1Jul 24, 2001
Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface
TOSHIBA KK21 citations92
US5907393AMay 25, 1999
Exposure mask and method and apparatus for manufacturing the same
TOSHIBA KK32 citations92
US5767521AJun 16, 1998
Electron-beam lithography system and method for drawing nanometer-order pattern
TOSHIBA KK68 citations92
US5728494AMar 17, 1998
Exposure mask and method and apparatus for manufacturing the same
TOSHIBA KK26 citations92
US5629115AMay 13, 1997
Exposure mask and method and apparatus for manufacturing the same
TOSHIBA KK33 citations92
US6040114AMar 21, 2000
Pattern forming method
TOSHIBA KK12 citations81
US6635549B2Oct 21, 2003
Method of producing exposure mask
TOSHIBA KK11 citations74
US6483083B2Nov 19, 2002
Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface
TOSHIBA KK7 citations74
US6319637B1Nov 20, 2001
Method for forming pattern
TOSHIBA KK10 citations74
US5262282ANov 16, 1993
Pattern forming method
TOSHIBA KK7 citations74
US4510173AApr 9, 1985
Method for forming flattened film
TOSHIBA KK14 citations74
US6680462B2Jan 20, 2004
Heat treating method and heat treating apparatus
TOSHIBA KK4 citations63
US6542237B1Apr 1, 2003
Exposure method for making precision patterns on a substrate
TOSHIBA KK5 citations63
US6495807B2Dec 17, 2002
Heat treating method and heat treating apparatus
TOSHIBA KK3 citations63
US6165652ADec 26, 2000
Pattern forming method and pattern forming apparatus
TOSHIBA KK3 citations62
US6806941B2Oct 19, 2004
Pattern forming method and pattern forming apparatus
TOSHIBA KK0 citations51
US6335145B1Jan 1, 2002
Pattern forming method and pattern forming apparatus
TOSHIBA KK0 citations51