Inventor
NAKAMOTO SHIGERU
JP32 patents
⚠️ This page may combine multiple inventors who share the name “NAKAMOTO SHIGERU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
27 patentsUS7047093B2May 16, 2006
Semiconductor manufacturing apparatus and its diagnosis apparatus and operating system
HITACHI HIGH TECH CORP22 citations92
US9934946B2Apr 3, 2018
Plasma processing apparatus and operating method of plasma processing apparatus
HITACHI HIGH TECH CORP9 citations84
US6901306B2May 31, 2005
Semiconductor manufacturing apparatus and its diagnosis apparatus and operating system
HITACHI HIGH TECH CORP7 citations73
US11437289B2Sep 6, 2022
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP4 citations71
US10020233B2Jul 10, 2018
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP2 citations71
US9741629B2Aug 22, 2017
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP3 citations71
US11605530B2Mar 14, 2023
Plasma processing apparatus, data processing apparatus and data processing method
HITACHI HIGH TECH CORP0 citations62
US11308182B2Apr 19, 2022
Data processing method, data processing apparatus and processing apparatus
HITACHI HIGH TECH CORP0 citations62
US12131964B2Oct 29, 2024
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations61
US11424110B2Aug 23, 2022
Plasma processing apparatus and operational method thereof
HITACHI HIGH TECH CORP0 citations61
US12368031B2Jul 22, 2025
Plasma processing method
HITACHI HIGH TECH CORP0 citations59
US11355324B2Jun 7, 2022
Plasma processing method
HITACHI HIGH TECH CORP0 citations59
US12051574B2Jul 30, 2024
Wafer processing method and plasma processing apparatus
HITACHI HIGH TECH CORP0 citations52
US11569135B2Jan 31, 2023
Plasma processing method and wavelength selection method used in plasma processing
HITACHI HIGH TECH CORP0 citations52
US10262840B2Apr 16, 2019
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations52
US12381071B2Aug 5, 2025
Plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP0 citations51
US10783220B2Sep 22, 2020
Data processing method, data processing apparatus and processing apparatus
HITACHI HIGH TECH CORP0 citations51
US10615010B2Apr 7, 2020
Plasma processing apparatus, data processing apparatus and data processing method
HITACHI HIGH TECH CORP0 citations51
US10073818B2Sep 11, 2018
Data processing method, data processing apparatus and processing apparatus
HITACHI HIGH TECH CORP0 citations51
US9865439B2Jan 9, 2018
Plasma processing apparatus
HITACHI HIGH TECH CORP1 citations51
US9767997B2Sep 19, 2017
Plasma processing apparatus and operational method thereof
HITACHI HIGH TECH CORP0 citations51
US12573601B2Mar 10, 2026
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations50
US10872774B2Dec 22, 2020
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations50
US11875978B2Jan 16, 2024
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations47
US12062530B2Aug 13, 2024
Vacuum processing apparatus and vacuum processing method
HITACHI HIGH TECH CORP0 citations46
US9805940B2Oct 31, 2017
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations41
US9190336B2Nov 17, 2015
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations40
HITACHI LTD
3 patentsUS6920369B2Jul 19, 2005
Methods of operating vacuum processing equipment and methods of processing wafers
HITACHI LTD17 citations91
US6795745B1Sep 21, 2004
Methods of operating vacuum processing equipment and methods of processing wafers
HITACHI LTD26 citations91
US6596551B1Jul 22, 2003
Etching end point judging method, etching end point judging device, and insulating film etching method using these methods
HITACHI LTD17 citations84