Inventor
MERCALDI GARRY A
US41 patents
Patents
41 patentsUS6673675B2Jan 6, 2004
Methods of fabricating an MRAM device using chemical mechanical polishing
MICRON TECHNOLOGY INC44 citations96
US6316370B1Nov 13, 2001
Method for etching doped polysilicon with high selectivity to undoped polysilicon
MICRON TECHNOLOGY INC47 citations96
US6150706ANov 21, 2000
Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer
MICRON TECHNOLOGY INC34 citations96
US5969983AOct 19, 1999
Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer
MICRON TECHNOLOGY INC38 citations96
US7148555B2Dec 12, 2006
Method for enhancing electrode surface area in DRAM cell capacitors
MICRON TECHNOLOGY INC12 citations93
US6794704B2Sep 21, 2004
Method for enhancing electrode surface area in DRAM cell capacitors
MICRON TECHNOLOGY INC24 citations93
US6573554B2Jun 3, 2003
Localized masking for semiconductor structure development
MICRON TECHNOLOGY INC13 citations93
US6541811B2Apr 1, 2003
Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer
MICRON TECHNOLOGY INC31 citations93
US6417015B2Jul 9, 2002
Semiconductor processing methods and semiconductor defect detection methods
MICRON TECHNOLOGY INC20 citations93
US6358793B1Mar 19, 2002
Method for localized masking for semiconductor structure development
MICRON TECHNOLOGY INC30 citations93
US6251693B1Jun 26, 2001
Semiconductor processing methods and semiconductor defect detection methods
MICRON TECHNOLOGY INC17 citations93
US6225157B1May 1, 2001
Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer
MICRON TECHNOLOGY INC21 citations93
US5976990ANov 2, 1999
Method for optimization of thin film deposition
MICRON TECHNOLOGY INC96 citations91
US7285811B2Oct 23, 2007
MRAM device for preventing electrical shorts during fabrication
MICRON TECHNOLOGY INC12 citations84
US7119388B2Oct 10, 2006
MRAM device fabricated using chemical mechanical polishing
MICRON TECHNOLOGY INC11 citations84
US6682970B1Jan 27, 2004
Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer
MICRON TECHNOLOGY INC14 citations84
US6639266B1Oct 28, 2003
Modifying material removal selectivity in semiconductor structure development
MICRON TECHNOLOGY INC19 citations84
US6479854B1Nov 12, 2002
Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer
MICRON TECHNOLOGY INC11 citations82
US6392284B1May 21, 2002
Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer
MICRON TECHNOLOGY INC13 citations82
US6368919B2Apr 9, 2002
Method and composite for decreasing charge leakage
MICRON TECHNOLOGY INC11 citations82
US7112503B1Sep 26, 2006
Enhanced surface area capacitor fabrication methods
MICRON TECHNOLOGY INC7 citations74
US7034353B2Apr 25, 2006
Methods for enhancing capacitors having roughened features to increase charge-storage capacity
MICRON TECHNOLOGY INC10 citations74
US7015529B2Mar 21, 2006
Localized masking for semiconductor structure development
MICRON TECHNOLOGY INC5 citations74
US7008845B2Mar 7, 2006
Method and composite for decreasing charge leakage
MICRON TECHNOLOGY INC3 citations74
US6987073B2Jan 17, 2006
Low selectivity deposition methods
MICRON TECHNOLOGY INC9 citations74
US6833084B2Dec 21, 2004
Etching compositions
MICRON TECHNOLOGY INC6 citations74
US6803280B2Oct 12, 2004
Method and composite for decreasing charge leakage
MICRON TECHNOLOGY INC4 citations74
US6746922B2Jun 8, 2004
Method and composite for decreasing charge leakage
MICRON TECHNOLOGY INC4 citations74
US6521945B2Feb 18, 2003
Method and composite for decreasing charge leakage
MICRON TECHNOLOGY INC4 citations74
US6387716B1May 14, 2002
Semiconductor processing methods and semiconductor defect detection methods
MICRON TECHNOLOGY INC12 citations74
US7576380B2Aug 18, 2009
Methods for enhancing capacitors having roughened features to increase charge-storage capacity
MICRON TECHNOLOGY INC4 citations72
US7642157B2Jan 5, 2010
Method for enhancing electrode surface area in DRAM cell capacitors
MICRON TECHNOLOGY INC3 citations63
US7573121B2Aug 11, 2009
Method for enhancing electrode surface area in DRAM cell capacitors
MICRON TECHNOLOGY INC1 citations63
US7468534B2Dec 23, 2008
Localized masking for semiconductor structure development
MICRON TECHNOLOGY INC1 citations63
US7192888B1Mar 20, 2007
Low selectivity deposition methods
MICRON TECHNOLOGY INC3 citations63
US7101756B2Sep 5, 2006
Methods for enhancing capacitors having roughened features to increase charge-storage capacity
MICRON TECHNOLOGY INC2 citations63
US7087490B2Aug 8, 2006
Method and composite for decreasing charge leakage
MICRON TECHNOLOGY INC1 citations63
US7989864B2Aug 2, 2011
Methods for enhancing capacitors having roughened features to increase charge-storage capacity
MICRON TECHNOLOGY INC2 citations61
US7868369B2Jan 11, 2011
Localized masking for semiconductor structure development
MICRON TECHNOLOGY INC0 citations52
US7288808B2Oct 30, 2007
Capacitor constructions with enhanced surface area
MICRON TECHNOLOGY INC0 citations52
US6791148B2Sep 14, 2004
Method and composite for decreasing charge leakage
MICRON TECHNOLOGY INC0 citations52