Inventor
MACK CHRIS A
US13 patents
⚠️ This page may combine multiple inventors who share the name “MACK CHRIS A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR TECH CORP
12 patentsUS7352453B2Apr 1, 2008
Method for process optimization and control by comparison between 2 or more measured scatterometry signals
KLA TENCOR TECH CORP56 citations97
US7382447B2Jun 3, 2008
Method for determining lithographic focus and exposure
KLA TENCOR TECH CORP46 citations95
US7804994B2Sep 28, 2010
Overlay metrology and control method
KLA TENCOR TECH CORP54 citations92
US7566517B1Jul 28, 2009
Feature printability optimization by optical tool
KLA TENCOR TECH CORP28 citations92
US7297453B2Nov 20, 2007
Systems and methods for mitigating variances on a patterned wafer using a prediction model
KLA TENCOR TECH CORP25 citations92
US7075639B2Jul 11, 2006
Method and mark for metrology of phase errors on phase shift masks
KLA TENCOR TECH CORP17 citations92
US7303842B2Dec 4, 2007
Systems and methods for modifying a reticle's optical properties
KLA TENCOR TECH CORP20 citations91
US7656512B2Feb 2, 2010
Method for determining lithographic focus and exposure
KLA TENCOR TECH CORP15 citations84
US7368208B1May 6, 2008
Measuring phase errors on phase shift masks
KLA TENCOR TECH CORP12 citations84
US7528953B2May 5, 2009
Target acquisition and overlay metrology based on two diffracted orders imaging
KLA TENCOR TECH CORP10 citations83
US7300725B2Nov 27, 2007
Method for determining and correcting reticle variations
KLA TENCOR TECH CORP3 citations62
US7300729B2Nov 27, 2007
Method for monitoring a reticle
KLA TENCOR TECH CORP4 citations62