Inventor
STOKOWSKI STANLEY E
US27 patents
⚠️ This page may combine multiple inventors who share the name “STOKOWSKI STANLEY E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR TECH CORP
11 patentsUS7088443B2Aug 8, 2006
System for detecting anomalies and/or features of a surface
KLA TENCOR TECH CORP43 citations93
US7564545B2Jul 21, 2009
Inspection methods and systems for lithographic masks
KLA TENCOR TECH CORP21 citations92
US7297453B2Nov 20, 2007
Systems and methods for mitigating variances on a patterned wafer using a prediction model
KLA TENCOR TECH CORP25 citations92
US7303842B2Dec 4, 2007
Systems and methods for modifying a reticle's optical properties
KLA TENCOR TECH CORP20 citations91
US6956644B2Oct 18, 2005
Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination
KLA TENCOR TECH CORP34 citations91
US6674522B2Jan 6, 2004
Efficient phase defect detection system and method
KLA TENCOR TECH CORP31 citations91
US7319229B2Jan 15, 2008
Illumination apparatus and methods
KLA TENCOR TECH CORP11 citations84
US7218392B2May 15, 2007
Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination
KLA TENCOR TECH CORP11 citations82
US7300725B2Nov 27, 2007
Method for determining and correcting reticle variations
KLA TENCOR TECH CORP3 citations62
US7300729B2Nov 27, 2007
Method for monitoring a reticle
KLA TENCOR TECH CORP4 citations62
US6577389B2Jun 10, 2003
System and methods for inspection of transparent mask substrates
KLA TENCOR TECH CORP5 citations61
KLA TENCOR CORP
9 patentsUS6215551B1Apr 10, 2001
Scanning system for inspecting anomalies on surfaces
KLA TENCOR CORP151 citations99
US5883710AMar 16, 1999
Scanning system for inspecting anomalies on surfaces
KLA TENCOR CORP209 citations99
US6636302B2Oct 21, 2003
Scanning system for inspecting anamolies on surfaces
KLA TENCOR CORP26 citations93
US8953869B2Feb 10, 2015
Apparatus and methods for inspecting extreme ultra violet reticles
KLA TENCOR CORP13 citations84
US7084967B2Aug 1, 2006
Scanning system for inspecting anomalies on surfaces
KLA TENCOR CORP13 citations84
US9645097B2May 9, 2017
In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
KLA TENCOR CORP10 citations80
US9886764B2Feb 6, 2018
Image acquisition system, image acquisition method, and inspection system
KLA TENCOR CORP2 citations71
US9679372B2Jun 13, 2017
Apparatus and methods for inspecting extreme ultra violet reticles
KLA TENCOR CORP0 citations52
US9619878B2Apr 11, 2017
Inspecting high-resolution photolithography masks
KLA TENCOR CORP0 citations41