Inventor
WACK DANIEL C
US19 patents
⚠️ This page may combine multiple inventors who share the name “WACK DANIEL C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
9 patentsUS7826071B2Nov 2, 2010
Parametric profiling using optical spectroscopic systems
KLA TENCOR CORP114 citations97
US8941336B1Jan 27, 2015
Optical characterization systems employing compact synchrotron radiation sources
KLA TENCOR CORP29 citations93
US8045179B1Oct 25, 2011
Bright and dark field scatterometry systems for line roughness metrology
KLA TENCOR CORP25 citations92
US8749179B2Jun 10, 2014
Optical characterization systems employing compact synchrotron radiation sources
KLA TENCOR CORP22 citations91
US7838309B1Nov 23, 2010
Measurement and control of strained devices
KLA TENCOR CORP12 citations84
US9544984B2Jan 10, 2017
System and method for generation of extreme ultraviolet light
KLA TENCOR CORP10 citations82
US11112691B2Sep 7, 2021
Inspection system with non-circular pupil
KLA TENCOR CORP2 citations69
US7951672B2May 31, 2011
Measurement and control of strained devices
KLA TENCOR CORP4 citations63
US7821654B2Oct 26, 2010
System for scatterometric measurements and applications
KLA TENCOR CORP3 citations63
KLA TENCOR TECH CORP
7 patentsUS7280230B2Oct 9, 2007
Parametric profiling using optical spectroscopic systems
KLA TENCOR TECH CORP71 citations97
US7099005B1Aug 29, 2006
System for scatterometric measurements and applications
KLA TENCOR TECH CORP49 citations96
US7716003B1May 11, 2010
Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction
KLA TENCOR TECH CORP23 citations92
US7301649B2Nov 27, 2007
System for scatterometric measurements and applications
KLA TENCOR TECH CORP21 citations92
US7515253B2Apr 7, 2009
System for measuring a sample with a layer containing a periodic diffracting structure
KLA TENCOR TECH CORP18 citations84
US7511830B2Mar 31, 2009
System for scatterometric measurements and applications
KLA TENCOR TECH CORP6 citations70
US7826072B1Nov 2, 2010
Method for optimizing the configuration of a scatterometry measurement system
KLA TENCOR TECH CORP6 citations62