Inventor
TOMETSUKA KOUJI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “TOMETSUKA KOUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
8 patentsUS6527884B1Mar 4, 2003
Hydrogen annealing process and apparatus therefor
HITACHI INT ELECTRIC INC428 citations96
US6780251B2Aug 24, 2004
Substrate processing apparatus and method for fabricating semiconductor device
HITACHI INT ELECTRIC INC40 citations92
US6712909B2Mar 30, 2004
Substrate processing apparatus and method for manufacturing semiconductor device
HITACHI INT ELECTRIC INC17 citations83
US6482753B1Nov 19, 2002
Substrate processing apparatus and method for manufacturing semiconductor device
HITACHI INT ELECTRIC INC18 citations83
US7003219B2Feb 21, 2006
Substrate processing method
HITACHI INT ELECTRIC INC5 citations73
US6540465B2Apr 1, 2003
Substrate processing apparatus
HITACHI INT ELECTRIC INC9 citations73
US6495473B2Dec 17, 2002
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC12 citations73
US7553518B2Jun 30, 2009
Substrate processing method
HITACHI INT ELECTRIC INC0 citations51
KOKUSAI ELECTRIC CO LTD
5 patentsUS5669644ASep 23, 1997
Wafer transfer plate
KOKUSAI ELECTRIC CO LTD90 citations93
US6251189B1Jun 26, 2001
Substrate processing apparatus and substrate processing method
KOKUSAI ELECTRIC CO LTD25 citations92
US6318944B1Nov 20, 2001
Semiconductor fabricating apparatus, method for modifying positional displacement of a wafer in a wafer cassette within the semiconductor fabricating apparatus and method for transferring the wafer cassette
KOKUSAI ELECTRIC CO LTD32 citations87
US6332898B1Dec 25, 2001
Substrate processing apparatus and maintenance method therefor
KOKUSAI ELECTRIC CO LTD6 citations72
US6143040ANov 7, 2000
Substrate processing apparatus and maintenance method therefor
KOKUSAI ELECTRIC CO LTD13 citations72