Inventor
PODLESNIK DRAGAN
US24 patents
⚠️ This page may combine multiple inventors who share the name “PODLESNIK DRAGAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
14 patentsUS6318384B1Nov 20, 2001
Self cleaning method of forming deep trenches in silicon substrates
APPLIED MATERIALS INC88 citations98
US6235643B1May 22, 2001
Method for etching a trench having rounded top and bottom corners in a silicon substrate
APPLIED MATERIALS INC305 citations98
US6583063B1Jun 24, 2003
Plasma etching of silicon using fluorinated gas mixtures
APPLIED MATERIALS INC59 citations96
US6270634B1Aug 7, 2001
Method for plasma etching at a high etch rate
APPLIED MATERIALS INC44 citations96
US6380095B1Apr 30, 2002
Silicon trench etch using silicon-containing precursors to reduce or avoid mask erosion
APPLIED MATERIALS INC66 citations95
US6180533B1Jan 30, 2001
Method for etching a trench having rounded top corners in a silicon substrate
APPLIED MATERIALS INC71 citations94
US6518192B2Feb 11, 2003
Two etchant etch method
APPLIED MATERIALS INC20 citations92
US6391788B1May 21, 2002
Two etchant etch method
APPLIED MATERIALS INC22 citations92
US6372655B2Apr 16, 2002
Two etchant etch method
APPLIED MATERIALS INC31 citations92
US5801386ASep 1, 1998
Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same
APPLIED MATERIALS INC36 citations92
US6593244B1Jul 15, 2003
Process for etching conductors at high etch rates
APPLIED MATERIALS INC22 citations91
US6383941B1May 7, 2002
Method of etching organic ARCs in patterns having variable spacings
APPLIED MATERIALS INC13 citations73
US6897155B2May 24, 2005
Method for etching high-aspect-ratio features
APPLIED MATERIALS INC11 citations71
US6808647B1Oct 26, 2004
Methodologies to reduce process sensitivity to the chamber condition
APPLIED MATERIALS INC6 citations61
MUI DAVID S L
3 patentsUS8211846B2Jul 3, 2012
Materials for particle removal by single-phase and two-phase media
MUI DAVID S L3 citations59
US8084406B2Dec 27, 2011
Apparatus for particle removal by single-phase and two-phase media
MUI DAVID S L3 citations59
US8226775B2Jul 24, 2012
Methods for particle removal by single-phase and two-phase media
MUI DAVID S L0 citations48