Inventor
EDINGER KLAUS
DE32 patents
⚠️ This page may combine multiple inventors who share the name “EDINGER KLAUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
10 patentsUS10060947B2Aug 28, 2018
Method and apparatus for analyzing and for removing a defect of an EUV photomask
ZEISS CARL SMT GMBH3 citations72
US9910065B2Mar 6, 2018
Apparatus and method for examining a surface of a mask
ZEISS CARL SMT GMBH2 citations69
US12292680B2May 6, 2025
Method and apparatuses for disposing of excess material of a photolithographic mask
ZEISS CARL SMT GMBH0 citations62
US12164226B2Dec 10, 2024
Method and apparatuses for disposing of excess material of a photolithographic mask
ZEISS CARL SMT GMBH0 citations62
US11874598B2Jan 16, 2024
Method and apparatuses for disposing of excess material of a photolithographic mask
ZEISS CARL SMT GMBH0 citations62
US11733186B2Aug 22, 2023
Device and method for analyzing a defect of a photolithographic mask or of a wafer
ZEISS CARL SMT GMBH0 citations61
US10983075B2Apr 20, 2021
Device and method for analysing a defect of a photolithographic mask or of a wafer
ZEISS CARL SMT GMBH1 citations61
US12517442B2Jan 6, 2026
Apparatus and method for removing a single particulate from a substrate
ZEISS CARL SMT GMBH0 citations55
US11886126B2Jan 30, 2024
Apparatus and method for removing a single particulate from a substrate
ZEISS CARL SMT GMBH1 citations55
US10119990B2Nov 6, 2018
Scanning probe microscope and method for examining a surface with a high aspect ratio
ZEISS CARL SMT GMBH0 citations42
AUTH NICOLE
4 patentsUS8632687B2Jan 21, 2014
Method for electron beam induced etching of layers contaminated with gallium
AUTH NICOLE14 citations81
US9023666B2May 5, 2015
Method for electron beam induced etching
AUTH NICOLE5 citations70
US8623230B2Jan 7, 2014
Methods and systems for removing a material from a sample
AUTH NICOLE3 citations60
US8318593B2Nov 27, 2012
Method for electron beam induced deposition of conductive material
AUTH NICOLE0 citations49
UNIV MARYLAND
3 patentsUS7238294B2Jul 3, 2007
Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
UNIV MARYLAND73 citations97
US6633711B1Oct 14, 2003
Focused ion-beam fabrication of fiber probes for use in near field scanning optical microscopy
UNIV MARYLAND13 citations82
US6518872B1Feb 11, 2003
High resolution scanning thermal probe and method of manufacturing thereof
UNIV MARYLAND17 citations77
NAWOTEC GMBH
3 patentsUS7452477B2Nov 18, 2008
Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surface
NAWOTEC GMBH28 citations91
US7232997B2Jun 19, 2007
Apparatus and method for investigating or modifying a surface with a beam of charged particles
NAWOTEC GMBH16 citations81
US7537708B2May 26, 2009
Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
NAWOTEC GMBH12 citations76