Inventor

BUDACH MICHAEL

DE27 patents

⚠️ This page may combine multiple inventors who share the name “BUDACH MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BUDACH MICHAEL

ZEISS CARL SMT GMBH

Scanning particle microscope and method for determining a position change of a particle beam of the scanning particle microscope

Method and apparatus for analyzing and for removing a defect of an EUV photomask

Methods and devices for examining an electrically charged specimen surface

Apparatus and method for examining a surface of a mask

Method and apparatuses for disposing of excess material of a photolithographic mask

Method and apparatuses for disposing of excess material of a photolithographic mask

Method and apparatuses for disposing of excess material of a photolithographic mask

Apparatus and method for examining and/or processing a sample

Apparatus and method for examining and/or processing a sample

Device and method for analyzing a defect of a photolithographic mask or of a wafer

Apparatus and method for determining a position of an element on a photolithographic mask

Apparatus and method for determining a position of an element on a photolithographic mask

Device and method for analysing a defect of a photolithographic mask or of a wafer

Methods and devices for examining an electrically charged specimen surface

Devices and methods for examining and/or processing an element for photolithography

Apparatus and method for repairing a photolithographic mask

Method and apparatus for analyzing a defective location of a photolithographic mask

Method, device and computer program for repairing a mask defect

Beam blanker and method for blanking a charged particle beam

Method and device for determining a reference point of an orientation marking on a substrate of a photolithographic mask in an automated manner

BUDACH MICHAEL

Method and apparatus for analyzing and/or repairing of an EUV mask defect

Determining a repairing form of a defect at or close to an edge of a substrate of a photo mask

EDINGER KLAUS

Apparatus and method for investigating and/or modifying a sample

ZEISS CARL NTS GMBH

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

ZEISS CARL SMS GMBH

Apparatus and method for investigating an object

WAIBLINGER MARKUS

Method for determining the performance of a photolithographic mask

BIHR JOHANNES

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof