Inventor

HOFMANN THORSTEN

DE17 patents

⚠️ This page may combine multiple inventors who share the name “HOFMANN THORSTEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOFMANN THORSTEN

ZEISS CARL SMT GMBH

Method and apparatus for analyzing and for removing a defect of an EUV photomask

Method and device for permanently repairing defects of absent material of a photolithographic mask

Apparatus and method for examining a surface of a mask

Device and method for analyzing a defect of a photolithographic mask or of a wafer

Device and method for analysing a defect of a photolithographic mask or of a wafer

Method and device for permanently repairing defects of absent material of a photolithographic mask

AUTH NICOLE

Method for electron beam induced etching of layers contaminated with gallium

Method for electron beam induced etching

Methods and systems for removing a material from a sample

Method for electron beam induced deposition of conductive material

ZEISS CARL SMS GMBH

Apparatus and method for analyzing and modifying a specimen surface

Apparatus and method for investigating an object

NAWOTEC GMBH

Apparatus and method for investigating or modifying a surface with a beam of charged particles

BRET TRISTAN

Method and apparatus for processing a substrate with a focused particle beam

EDINGER KLAUS

Apparatus and method for investigating and/or modifying a sample

BUDACH MICHAEL

Method and apparatus for analyzing and/or repairing of an EUV mask defect

NAWO TEC GMBH

Method for high-resolution processing of thin layers using electron beams