Inventor
IWAI TAKESHI
JP60 patents
⚠️ This page may combine multiple inventors who share the name “IWAI TAKESHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
37 patentsUS7323287B2Jan 29, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD77 citations99
US7074543B2Jul 11, 2006
Positive resist composition and method of forming resist pattern from the same
TOKYO OHKA KOGYO CO LTD151 citations99
US7482108B2Jan 27, 2009
Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns
TOKYO OHKA KOGYO CO LTD92 citations97
US6010824AJan 4, 2000
Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same
TOKYO OHKA KOGYO CO LTD109 citations97
US6444397B2Sep 3, 2002
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD39 citations96
US6897012B2May 24, 2005
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD13 citations93
US5885746AMar 23, 1999
Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate
TOKYO OHKA KOGYO CO LTD22 citations93
US7527909B2May 5, 2009
Resist composition
TOKYO OHKA KOGYO CO LTD9 citations84
US7501220B2Mar 10, 2009
Resist composition
TOKYO OHKA KOGYO CO LTD9 citations84
US6749989B2Jun 15, 2004
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD16 citations84
US7927780B2Apr 19, 2011
Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
TOKYO OHKA KOGYO CO LTD9 citations83
US7776510B2Aug 17, 2010
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD14 citations83
US7435530B2Oct 14, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD5 citations74
US7183368B2Feb 27, 2007
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD7 citations74
US6759176B2Jul 6, 2004
Positive-working resist composition
TOKYO OHKA KOGYO CO LTD10 citations74
US7608381B2Oct 27, 2009
Polymer compound, positive resist composition and process for forming resist pattern
TOKYO OHKA KOGYO CO LTD7 citations73
US7541138B2Jun 2, 2009
Resist composition
TOKYO OHKA KOGYO CO LTD6 citations73
US7488568B2Feb 10, 2009
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD7 citations73
US5908734AJun 1, 1999
Image formation method with a post exposure heating step
TOKYO OHKA KOGYO CO LTD7 citations73
US7771911B2Aug 10, 2010
Process for producing photoresist composition, filter, coater and photoresist composition
TOKYO OHKA KOGYO CO LTD7 citations69
US8007981B2Aug 30, 2011
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD5 citations63
US7799507B2Sep 21, 2010
Positive resist composition for immersion lithography and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD6 citations63
US7745097B2Jun 29, 2010
Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations63
US7534550B2May 19, 2009
Positive resist composition and process for formation of resist patterns
TOKYO OHKA KOGYO CO LTD6 citations63
US7316885B2Jan 8, 2008
Method of forming resist pattern, positive resist composition, and layered product
TOKYO OHKA KOGYO CO LTD6 citations63
US7316888B2Jan 8, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD2 citations63
US7316889B2Jan 8, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD2 citations63
US11667767B2Jun 6, 2023
Cladding composition, and method for producing metal/resin bonded member
TOKYO OHKA KOGYO CO LTD0 citations62
US7544460B2Jun 9, 2009
Resist composition, multilayer body, and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations62
US7919227B2Apr 5, 2011
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations52
US7767377B2Aug 3, 2010
Positive type resist composition, process for forming resist pattern, and process for performing ion implantation
TOKYO OHKA KOGYO CO LTD1 citations52
US7501221B2Mar 10, 2009
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD0 citations52
US7390612B2Jun 24, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD0 citations52
US7326515B2Feb 5, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD0 citations52
US6749991B2Jun 15, 2004
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD0 citations52
US8021824B2Sep 20, 2011
Polymer compound, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD1 citations51
US7939243B2May 10, 2011
Resin, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations51
IWAI TAKESHI
4 patentsUSD680249SApr 16, 2013
Rear combination lamp for automobile
IWAI TAKESHI16 citations83
USD680248SApr 16, 2013
Rear combination for an automobile
IWAI TAKESHI6 citations83
US8293449B2Oct 23, 2012
Positive resist composition and method of forming resist pattern
IWAI TAKESHI3 citations62
USD679039SMar 26, 2013
Head lamp for automobile
IWAI TAKESHI1 citations51
NISSAN MOTOR
2 patentsMOMOSE HIKARU
2 patentsIRIE MAKIKO
1 patentTOYOTA MOTOR CO LTD
1 patentNAT UNIV CORP YOKOHAMA NAT UNIV
1 patentMITSUBISHI RAYON CO
1 patentTAKESHITA MASARU
1 patentShowing the top 50 of 60 patents by PatentIndex Score.