Inventor
MOYAMA KAZUKI
JP25 patents
⚠️ This page may combine multiple inventors who share the name “MOYAMA KAZUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
18 patentsUS11094507B2Aug 17, 2021
Power generation systems and methods for plasma stability and control
TOKYO ELECTRON LTD13 citations84
US11613432B2Mar 28, 2023
Processing system and method using transporting device facilitating replacement of consumable part
TOKYO ELECTRON LTD2 citations72
US11050394B2Jun 29, 2021
Modules, multi-stage systems, and related methods for radio frequency power amplifiers
TOKYO ELECTRON LTD4 citations72
US10896842B2Jan 19, 2021
Manufacturing method of sample table
TOKYO ELECTRON LTD2 citations70
US12451327B2Oct 21, 2025
Apparatus for plasma processing
TOKYO ELECTRON LTD1 citations64
US11699573B2Jul 11, 2023
Plasma processing method
TOKYO ELECTRON LTD0 citations62
US11107663B2Aug 31, 2021
Plasma processing system and plasma processing method
TOKYO ELECTRON LTD0 citations62
US11043389B2Jun 22, 2021
Substrate processing method
TOKYO ELECTRON LTD0 citations62
US11721524B2Aug 8, 2023
Power generation systems and methods for plasma stability and control
TOKYO ELECTRON LTD0 citations61
US9048070B2Jun 2, 2015
Dielectric window for plasma treatment device, and plasma treatment device
TOKYO ELECTRON LTD3 citations61
US12322578B2Jun 3, 2025
Exhaust device, processing apparatus, and exhausting method
TOKYO ELECTRON LTD0 citations60
US11315770B2Apr 26, 2022
Exhaust device for processing apparatus provided with multiple blades
TOKYO ELECTRON LTD0 citations60
US10510512B2Dec 17, 2019
Methods and systems for controlling plasma performance
TOKYO ELECTRON LTD1 citations59
US11041241B2Jun 22, 2021
Plasma processing apparatus and temperature control method
TOKYO ELECTRON LTD0 citations52
US12456613B2Oct 28, 2025
Plasma processing system, plasma processing apparatus, and method for replacing edge ring
TOKYO ELECTRON LTD0 citations51
US12186898B2Jan 7, 2025
Part transporting device and processing system
TOKYO ELECTRON LTD0 citations51
US12463025B2Nov 4, 2025
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations47
US9892951B2Feb 13, 2018
Method of controlling adherence of microparticles to substrate to be processed, and processing apparatus
TOKYO ELECTRON LTD0 citations40
MOYAMA KAZUKI
2 patentsUS8328999B2Dec 11, 2012
Method for controlling film forming apparatus, film forming method, film forming apparatus, organic EL electronic device, and storage medium having program for controlling film forming apparatus stored therein
MOYAMA KAZUKI6 citations70
US9111726B2Aug 18, 2015
Plasma processing apparatus
MOYAMA KAZUKI2 citations59