Inventor

NAGORNY VLADIMIR

US22 patents

⚠️ This page may combine multiple inventors who share the name “NAGORNY VLADIMIR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NAGORNY VLADIMIR

APPLIED MATERIALS INC

Edge ring

Plasma sources and plasma processing apparatus thereof

Plasma processing with independent temperature control

Film thickness uniformity improvement using edge ring and bias electrode geometry

Plasma source for semiconductor processing

Plasma source for semiconductor processing

Addressable plasma delivery methods and devices

Plasma sources and plasma processing apparatus thereof

Image-based digital control of plasma processing

Film thickness uniformity improvement using edge ring and bias electrode geometry

Thin film treatment process

Apparatus to improve process non-uniformity for semiconductor direct plasma processing

Plasma processing with tunable nitridation

Uniformity control for plasma processing

Digital control of plasma processing

MATTSON TECH INC

Workpiece support with fluid zones for temperature control

Plasma strip tool with uniformity control

Plasma processing apparatus with post plasma gas injection

System and method for protection of vacuum seals in plasma processing systems

Controlling azimuthal uniformity of etch process in plasma processing chamber

NAGORNY VLADIMIR

High efficiency plasma source

Inductively coupled plasma source for plasma processing