Inventor
KUO MEI-RU
TW3 patents
Patents
3 patentsUS6440875B1Aug 27, 2002
Masking layer method for forming a spacer layer with enhanced linewidth control
TAIWAN SEMICONDUCTOR MFG33 citations90
US6436841B1Aug 20, 2002
Selectivity oxide-to-oxynitride etch process using a fluorine containing gas, an inert gas and a weak oxidant
TAIWAN SEMICONDUCTOR MFG22 citations88
US6764911B2Jul 20, 2004
Multiple etch method for fabricating spacer layers
TAIWAN SEMICONDUCTOR MFG10 citations67