Inventor
YOSHINO TOMOHARU
JP27 patents
⚠️ This page may combine multiple inventors who share the name “YOSHINO TOMOHARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADEKA CORP
20 patentsUS10882874B2Jan 5, 2021
Vanadium compound
ADEKA CORP2 citations72
US9994593B2Jun 12, 2018
Copper compound, starting material for forming thin film, and method for manufacturing thin film
ADEKA CORP2 citations72
US12275748B2Apr 15, 2025
Amidinate compound, dimer compound thereof, thin-film forming raw material, and method of producing thin film
ADEKA CORP2 citations70
US12371778B2Jul 29, 2025
Cobalt compound, thin-film forming raw material, thin-film, and method of producing thin-film
ADEKA CORP0 citations62
US11623935B2Apr 11, 2023
Raw material for forming thin film by atomic layer deposition method, method of producing thin film, and alkoxide compound
ADEKA CORP0 citations62
US10920313B2Feb 16, 2021
Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin film
ADEKA CORP0 citations62
US11618762B2Apr 4, 2023
Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound
ADEKA CORP0 citations60
US11555044B2Jan 17, 2023
Thin-film forming raw material for use in atomic layer deposition method, thin-film forming raw material, method for producing thin-film, and compound
ADEKA CORP0 citations60
US11161867B2Nov 2, 2021
Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound
ADEKA CORP0 citations60
US12480207B2Nov 25, 2025
Tin compound, thin-film forming raw material, thin-film, method for producing thin-film, and halogen compound
ADEKA CORP0 citations59
US12415821B2Sep 16, 2025
Tin compound, thin-film forming raw material containing said compound, thin film formed from said thin-film forming raw material, method of producing said thin film using said compound as precursor, and method of producing said thin film
ADEKA CORP0 citations59
US11760771B2Sep 19, 2023
Ruthenium compound, raw material for forming thin film, and method for producing thin film
ADEKA CORP0 citations59
US10253408B2Apr 9, 2019
Compound, thin film-forming material, and thin film manufacturing method
ADEKA CORP1 citations57
US10351584B2Jul 16, 2019
Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound
ADEKA CORP0 citations51
US10167304B2Jan 1, 2019
Ruthenium compound, material for thin film formation, and process for thin film formation
ADEKA CORP0 citations51
US10155784B2Dec 18, 2018
Alcohol compound
ADEKA CORP0 citations51
US9896468B2Feb 20, 2018
Metal alkoxide compound, thin-film-forming material, method for producing thin film, and alcohol compound
ADEKA CORP1 citations51
US10364495B2Jul 30, 2019
Method for producing a thin film
ADEKA CORP0 citations50
US9663538B2May 30, 2017
Aluminum compound, thin-film forming raw material, and method for producing thin film
ADEKA CORP1 citations50
US10011623B2Jul 3, 2018
Alkoxide compound, thin film-forming starting material, and thin film formation method
ADEKA CORP0 citations40
SAMSUNG ELECTRONICS CO LTD
2 patentsUS9359382B2Jun 7, 2016
β-ketoimine ligand, method of preparing the same, metal complex comprising the same and method of forming thin film using the same
SAMSUNG ELECTRONICS CO LTD2 citations61
US9359383B2Jun 7, 2016
β-ketoimine ligand, method of preparing the same, metal complex comprising the same and method of forming thin film using the same
SAMSUNG ELECTRONICS CO LTD0 citations50