Inventor
WARD CHRISTOPHER CHARLES
US17 patents
⚠️ This page may combine multiple inventors who share the name “WARD CHRISTOPHER CHARLES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML HOLDING NV
8 patentsUS9632433B2Apr 25, 2017
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
ASML HOLDING NV2 citations70
US9632434B2Apr 25, 2017
Reticle cooling system in a lithographic apparatus
ASML HOLDING NV3 citations70
US9740112B2Aug 22, 2017
Patterning device support and lithographic apparatus
ASML HOLDING NV2 citations67
US9766557B2Sep 19, 2017
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
ASML HOLDING NV1 citations60
US9977351B2May 22, 2018
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
ASML HOLDING NV0 citations50
US9632429B2Apr 25, 2017
Real-time reticle curvature sensing
ASML HOLDING NV1 citations50
US10423081B2Sep 24, 2019
Reticle cooling by non-uniform gas flow
ASML HOLDING NV0 citations47
US9329502B2May 3, 2016
Lithographic apparatuses and methods for compensating for eigenmode coupling
ASML HOLDING NV0 citations28
ASML NETHERLANDS BV
8 patentsUS10394139B2Aug 27, 2019
Patterning device cooling apparatus
ASML NETHERLANDS BV2 citations68
US9513568B2Dec 6, 2016
Lithographic apparatus
ASML NETHERLANDS BV2 citations61
US10788763B2Sep 29, 2020
Lithographic apparatus
ASML NETHERLANDS BV0 citations51
US10642166B2May 5, 2020
Patterning device cooling apparatus
ASML NETHERLANDS BV0 citations48
US10281830B2May 7, 2019
Patterning device cooling systems in a lithographic apparatus
ASML NETHERLANDS BV0 citations47
US9910368B2Mar 6, 2018
Patterning device manipulating system and lithographic apparatuses
ASML NETHERLANDS BV0 citations47
US9857694B2Jan 2, 2018
Estimating deformation of a patterning device and/or a change in its position
ASML NETHERLANDS BV0 citations39
US10031428B2Jul 24, 2018
Gas flow optimization in reticle stage environment
ASML NETHERLANDS BV0 citations35