Inventor
TETSUKA TSUTOMU
JP28 patents
⚠️ This page may combine multiple inventors who share the name “TETSUKA TSUTOMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
12 patentsUS6833051B2Dec 21, 2004
Plasma processing apparatus and method
HITACHI LTD33 citations96
US6388382B1May 14, 2002
Plasma processing apparatus and method
HITACHI LTD78 citations96
US6180019B1Jan 30, 2001
Plasma processing apparatus and method
HITACHI LTD51 citations96
US6499424B2Dec 31, 2002
Plasma processing apparatus and method
HITACHI LTD23 citations93
US6756737B2Jun 29, 2004
Plasma processing apparatus and method
HITACHI LTD37 citations92
US6716301B2Apr 6, 2004
Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe
HITACHI LTD25 citations92
US6427621B1Aug 6, 2002
Plasma processing device and plasma processing method
HITACHI LTD42 citations92
US7601241B2Oct 13, 2009
Plasma processing apparatus and plasma processing method
HITACHI LTD9 citations84
US6846363B2Jan 25, 2005
Plasma processing apparatus and method
HITACHI LTD11 citations82
US6481370B2Nov 19, 2002
Plasma processsing apparatus
HITACHI LTD10 citations74
US6755935B2Jun 29, 2004
Plasma processing apparatus
HITACHI LTD5 citations63
US7771607B2Aug 10, 2010
Plasma processing apparatus and plasma processing method
HITACHI LTD1 citations52
HITACHI HIGH TECH CORP
11 patentsUS7931776B2Apr 26, 2011
Plasma processing apparatus
HITACHI HIGH TECH CORP8 citations84
US6899766B2May 31, 2005
Diagnosis method for semiconductor processing apparatus
HITACHI HIGH TECH CORP6 citations74
US6866744B2Mar 15, 2005
Semiconductor processing apparatus and a diagnosis method therefor
HITACHI HIGH TECH CORP5 citations74
US10217613B2Feb 26, 2019
Plasma processing apparatus
HITACHI HIGH TECH CORP3 citations69
US9097754B2Aug 4, 2015
Method of manufacturing magnetoresistive element
HITACHI HIGH TECH CORP2 citations63
US7908104B2Mar 15, 2011
Plasma processing apparatus and method for detecting status of said apparatus
HITACHI HIGH TECH CORP4 citations63
US12051560B2Jul 30, 2024
Ion gun and ion milling machine
HITACHI HIGH TECH CORP0 citations62
US8006340B2Aug 30, 2011
Cleaning apparatus
HITACHI HIGH TECH CORP2 citations62
US10796884B2Oct 6, 2020
Plasma processing apparatus
HITACHI HIGH TECH CORP1 citations61
US8024831B2Sep 27, 2011
Cleaning method
HITACHI HIGH TECH CORP0 citations51
US10229813B2Mar 12, 2019
Plasma processing apparatus with lattice-like faraday shields
HITACHI HIGH TECH CORP0 citations40