Inventor
TSENG HAN-LIANG
TW22 patents
⚠️ This page may combine multiple inventors who share the name “TSENG HAN-LIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VANGUARD INT SEMICONDUCT CORP
14 patentsUS10651218B1May 12, 2020
Optical sensor structure and method for forming the same
VANGUARD INT SEMICONDUCT CORP4 citations72
US10699092B2Jun 30, 2020
Optical sensor and manufacturing method thereof
VANGUARD INT SEMICONDUCT CORP1 citations62
US11049771B2Jun 29, 2021
Semiconductor device and fingerprint identification device
VANGUARD INT SEMICONDUCT CORP0 citations61
US10915727B2Feb 9, 2021
Optical sensor and method for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations61
US11989966B2May 21, 2024
Semiconductor devices and methods for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations60
US11271024B2Mar 8, 2022
Semiconductor device and method for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations60
US11177397B2Nov 16, 2021
Semiconductor devices and methods for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations60
US11152422B2Oct 19, 2021
Semiconductor devices and methods for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations60
US11315964B2Apr 26, 2022
Optical sensors and methods for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations59
US10935805B2Mar 2, 2021
Optical sensor and method for forming the same
VANGUARD INT SEMICONDUCT CORP1 citations59
US11621287B2Apr 4, 2023
Optical sensor device with reduced thickness and method for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations51
US11482552B2Oct 25, 2022
Semiconductor devices and methods for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations51
US10770602B1Sep 8, 2020
Optical sensor and method for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations49
US10763288B1Sep 1, 2020
Semiconductor device and method for forming the same
VANGUARD INT SEMICONDUCT CORP0 citations39
TAIWAN SEMICONDUCTOR MFG
8 patentsUS5530418AJun 25, 1996
Method for shielding polysilicon resistors from hydrogen intrusion
TAIWAN SEMICONDUCTOR MFG63 citations96
US6004864ADec 21, 1999
Ion implant method for forming trench isolation for integrated circuit devices
TAIWAN SEMICONDUCTOR MFG23 citations92
US5949547ASep 7, 1999
System for in-line monitoring of photo processing in VLSI fabrication
TAIWAN SEMICONDUCTOR MFG37 citations92
US6001540ADec 14, 1999
Microlens process
TAIWAN SEMICONDUCTOR MFG45 citations89
US5990567ANov 23, 1999
System for in-line monitoring of photo processing tilt in VLSI fabrication
TAIWAN SEMICONDUCTOR MFG6 citations73
US8049323B2Nov 1, 2011
Chip holder with wafer level redistribution layer
TAIWAN SEMICONDUCTOR MFG2 citations62
US6710889B2Mar 23, 2004
Method for improved dielectric layer metrology calibration
TAIWAN SEMICONDUCTOR MFG6 citations58
US7662665B2Feb 16, 2010
Method for fabricating a semiconductor package including stress relieving layer for flip chip packaging
TAIWAN SEMICONDUCTOR MFG0 citations42