Inventor
NISHIO RYOJI
JP42 patents
⚠️ This page may combine multiple inventors who share the name “NISHIO RYOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
16 patentsUS6646233B2Nov 11, 2003
Wafer stage for wafer processing apparatus and wafer processing method
HITACHI HIGH TECH CORP89 citations98
US7138606B2Nov 21, 2006
Wafer processing method
HITACHI HIGH TECH CORP53 citations96
US6895179B2May 17, 2005
Wafer stage for wafer processing apparatus
HITACHI HIGH TECH CORP37 citations92
US6825617B2Nov 30, 2004
Semiconductor processing apparatus
HITACHI HIGH TECH CORP37 citations92
US8632637B2Jan 21, 2014
Method and apparatus for plasma processing
HITACHI HIGH TECH CORP6 citations84
US7833429B2Nov 16, 2010
Plasma processing method
HITACHI HIGH TECH CORP7 citations74
US7740739B2Jun 22, 2010
Plasma processing apparatus and method
HITACHI HIGH TECH CORP5 citations74
US9566821B2Feb 14, 2017
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP2 citations71
US7713756B2May 11, 2010
Apparatus and method for plasma etching
HITACHI HIGH TECH CORP2 citations63
US7183715B2Feb 27, 2007
Method for operating a semiconductor processing apparatus
HITACHI HIGH TECH CORP2 citations63
US6835665B2Dec 28, 2004
Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method
HITACHI HIGH TECH CORP5 citations63
US10262835B2Apr 16, 2019
Plasma processing equipment and plasma generation equipment
HITACHI HIGH TECH CORP1 citations62
US10998168B2May 4, 2021
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations60
US8366870B2Feb 5, 2013
Method and apparatus for plasma processing
HITACHI HIGH TECH CORP0 citations52
US7892444B2Feb 22, 2011
Plasma processing apparatus and method for controlling the same
HITACHI HIGH TECH CORP0 citations52
US10229813B2Mar 12, 2019
Plasma processing apparatus with lattice-like faraday shields
HITACHI HIGH TECH CORP0 citations40
HITACHI LTD
14 patentsUS6245202B1Jun 12, 2001
Plasma treatment device
HITACHI LTD115 citations98
US6833051B2Dec 21, 2004
Plasma processing apparatus and method
HITACHI LTD33 citations96
US6590179B2Jul 8, 2003
Plasma processing apparatus and method
HITACHI LTD66 citations96
US6180019B1Jan 30, 2001
Plasma processing apparatus and method
HITACHI LTD51 citations96
US6499424B2Dec 31, 2002
Plasma processing apparatus and method
HITACHI LTD23 citations93
US6172321B1Jan 9, 2001
Method and apparatus for plasma processing apparatus
HITACHI LTD26 citations93
US6034346AMar 7, 2000
Method and apparatus for plasma processing apparatus
HITACHI LTD27 citations93
US6759253B2Jul 6, 2004
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
HITACHI LTD27 citations92
US6716301B2Apr 6, 2004
Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe
HITACHI LTD25 citations92
US6771481B2Aug 3, 2004
Plasma processing apparatus for processing semiconductor wafer using plasma
HITACHI LTD19 citations84
US6846363B2Jan 25, 2005
Plasma processing apparatus and method
HITACHI LTD11 citations82
US6967109B2Nov 22, 2005
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
HITACHI LTD6 citations74
US6747239B2Jun 8, 2004
Plasma processing apparatus and method
HITACHI LTD8 citations74
US6481370B2Nov 19, 2002
Plasma processsing apparatus
HITACHI LTD10 citations74
NISHIO RYOJI
4 patentsUS8906196B2Dec 9, 2014
Plasma processing apparatus and method for controlling the same
NISHIO RYOJI11 citations83
US8057634B2Nov 15, 2011
Method and apparatus for plasma processing
NISHIO RYOJI7 citations83
US8062473B2Nov 22, 2011
Plasma processing apparatus and method
NISHIO RYOJI4 citations61
US8795467B2Aug 5, 2014
Plasma processing apparatus and method
NISHIO RYOJI0 citations51