Inventor
CHOU CHIA CHENG
TW45 patents
⚠️ This page may combine multiple inventors who share the name “CHOU CHIA CHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
23 patentsUS10163691B2Dec 25, 2018
Low-K dielectric interconnect systems
TAIWAN SEMICONDUCTOR MFG CO LTD36 citations94
US9754822B1Sep 5, 2017
Interconnect structure and method
TAIWAN SEMICONDUCTOR MFG CO LTD30 citations94
US9679804B1Jun 13, 2017
Multi-patterning to form vias with straight profiles
TAIWAN SEMICONDUCTOR MFG CO LTD19 citations92
US10269627B2Apr 23, 2019
Interconnect structure and method
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US11929329B2Mar 12, 2024
Damascene process using cap layer
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations75
US11929281B2Mar 12, 2024
Reducing oxidation by etching sacrificial and protection layer separately
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11049763B2Jun 29, 2021
Multi-patterning to form vias with straight profiles
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10840134B2Nov 17, 2020
Interconnect structure and method
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9768061B1Sep 19, 2017
Low-k dielectric interconnect systems
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10707165B2Jul 7, 2020
Semiconductor device having an extra low-k dielectric layer and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US12424438B2Sep 23, 2025
Low-k dielectric and processes for forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12255138B2Mar 18, 2025
Interconnect structures of semiconductor device and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11923294B2Mar 5, 2024
Interconnect structures of semiconductor device and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11417602B2Aug 16, 2022
Semiconductor device having an extra low-k dielectric layer and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11373947B2Jun 28, 2022
Methods of forming interconnect structures of semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11328952B2May 10, 2022
Interconnect structure and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11062901B2Jul 13, 2021
Low-k dielectric and processes for forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10910216B2Feb 2, 2021
Low-k dielectric and processes for forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12062613B2Aug 13, 2024
Semiconductor device having an extra low-k dielectric layer and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10510585B2Dec 17, 2019
Multi-patterning to form vias with straight profiles
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9748134B2Aug 29, 2017
Method of making interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9589856B2Mar 7, 2017
Automatically adjusting baking process for low-k dielectric material
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US9236294B2Jan 12, 2016
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
TAIWAN SEMICONDUCTOR MFG
13 patentsUS7968451B2Jun 28, 2011
Method for forming self-assembled mono-layer liner for Cu/porous low-k interconnections
TAIWAN SEMICONDUCTOR MFG8 citations84
US7723226B2May 25, 2010
Interconnects containing bilayer porous low-k dielectrics using different porogen to structure former ratio
TAIWAN SEMICONDUCTOR MFG11 citations84
US9257331B2Feb 9, 2016
Method of making interconnect structure
TAIWAN SEMICONDUCTOR MFG1 citations63
US7485949B2Feb 3, 2009
Semiconductor device
TAIWAN SEMICONDUCTOR MFG4 citations63
US7466027B2Dec 16, 2008
Interconnect structures with surfaces roughness improving liner and methods for fabricating the same
TAIWAN SEMICONDUCTOR MFG5 citations63
US7314828B2Jan 1, 2008
Repairing method for low-k dielectric materials
TAIWAN SEMICONDUCTOR MFG6 citations63
US8043959B2Oct 25, 2011
Method of forming a low-k dielectric layer with improved damage resistance and chemical integrity
TAIWAN SEMICONDUCTOR MFG3 citations62
US9004914B2Apr 14, 2015
Method of and apparatus for active energy assist baking
TAIWAN SEMICONDUCTOR MFG0 citations52
US8877083B2Nov 4, 2014
Surface treatment in the formation of interconnect structure
TAIWAN SEMICONDUCTOR MFG0 citations52
US8354346B2Jan 15, 2013
Method for fabricating low-k dielectric and Cu interconnect
TAIWAN SEMICONDUCTOR MFG0 citations52
US7998873B2Aug 16, 2011
Method for fabricating low-k dielectric and Cu interconnect
TAIWAN SEMICONDUCTOR MFG0 citations52
US9373581B2Jun 21, 2016
Interconnect structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG0 citations51
US8993442B2Mar 31, 2015
Interconnect structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG1 citations51
KO CHUNG-CHI
3 patentsUS8629056B2Jan 14, 2014
Method for forming self-assembled mono-layer liner for cu/porous low-k interconnections
KO CHUNG-CHI0 citations51
US8481412B2Jul 9, 2013
Method of and apparatus for active energy assist baking
KO CHUNG-CHI1 citations51
US9087877B2Jul 21, 2015
Low-k interconnect structures with reduced RC delay
KO CHUNG-CHI0 citations40