Inventor
TE LI CHUN
TW13 patents
Patents
13 patentsUS10304677B2May 28, 2019
Low-k feature formation processes and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations82
US10833170B2Nov 10, 2020
Low-k gate spacer and methods for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10490650B2Nov 26, 2019
Low-k gate spacer and methods for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10707165B2Jul 7, 2020
Semiconductor device having an extra low-k dielectric layer and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US12424438B2Sep 23, 2025
Low-k dielectric and processes for forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11855182B2Dec 26, 2023
Low-k gate spacer and methods for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11417602B2Aug 16, 2022
Semiconductor device having an extra low-k dielectric layer and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11062901B2Jul 13, 2021
Low-k dielectric and processes for forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10910216B2Feb 2, 2021
Low-k dielectric and processes for forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12506001B2Dec 23, 2025
Low-K feature formation processes and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11705327B2Jul 18, 2023
Low-k feature formation processes and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11295948B2Apr 5, 2022
Low-K feature formation processes and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10950431B2Mar 16, 2021
Low-k feature formation processes and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61