Inventor
KANAI SABURO
JP29 patents
Patents
29 patentsUS6171438B1Jan 9, 2001
Plasma processing apparatus and plasma processing method
HITACHI LTD100 citations99
US6245202B1Jun 12, 2001
Plasma treatment device
HITACHI LTD115 citations98
US6833051B2Dec 21, 2004
Plasma processing apparatus and method
HITACHI LTD33 citations96
US6815365B2Nov 9, 2004
Plasma etching apparatus and plasma etching method
HITACHI LTD44 citations96
US6373681B2Apr 16, 2002
Electrostatic chuck, and method of and apparatus for processing sample using the chuck
HITACHI LTD67 citations96
US6243251B1Jun 5, 2001
Electrostatic chuck, and method of and apparatus for processing sample using the chuck
HITACHI LTD50 citations96
US6180019B1Jan 30, 2001
Plasma processing apparatus and method
HITACHI LTD51 citations96
US5946184AAug 31, 1999
Electrostatic chuck, and method of and apparatus for processing sample
HITACHI LTD87 citations96
US5895586AApr 20, 1999
Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum
HITACHI LTD74 citations96
US5536359AJul 16, 1996
Semiconductor device manufacturing apparatus and method with optical monitoring of state of processing chamber
HITACHI LTD86 citations96
US5276386AJan 4, 1994
Microwave plasma generating method and apparatus
HITACHI LTD66 citations96
US5874012AFeb 23, 1999
Plasma processing apparatus and plasma processing method
HITACHI LTD60 citations95
US6499424B2Dec 31, 2002
Plasma processing apparatus and method
HITACHI LTD23 citations93
US6549393B2Apr 15, 2003
Semiconductor wafer processing apparatus and method
HITACHI LTD19 citations92
US6482747B1Nov 19, 2002
Plasma treatment method and plasma treatment apparatus
HITACHI LTD22 citations92
US6235146B1May 22, 2001
Vacuum treatment system and its stage
HITACHI LTD22 citations92
US5804033ASep 8, 1998
Microwave plasma processing method and apparatus
HITACHI LTD32 citations92
US5781400AJul 14, 1998
Electrostatically attracting electrode and a method of manufacture thereof
HITACHI LTD34 citations92
US5520771AMay 28, 1996
Microwave plasma processing apparatus
HITACHI LTD28 citations92
US6583979B1Jun 24, 2003
Electrostatically attracting electrode and a method of manufacture thereof
HITACHI LTD25 citations91
US6370007B2Apr 9, 2002
Electrostatic chuck
HITACHI LTD17 citations83
US6846363B2Jan 25, 2005
Plasma processing apparatus and method
HITACHI LTD11 citations82
US6156663ADec 5, 2000
Method and apparatus for plasma processing
HITACHI LTD16 citations82
US6481370B2Nov 19, 2002
Plasma processsing apparatus
HITACHI LTD10 citations74
US7565879B2Jul 28, 2009
Plasma processing apparatus
HITACHI LTD6 citations73
US7208422B2Apr 24, 2007
Plasma processing method
HITACHI LTD4 citations73
US5914051AJun 22, 1999
Microwave plasma processing method and apparatus
HITACHI LTD10 citations73
US5785807AJul 28, 1998
Microwave plasma processing method and apparatus
HITACHI LTD11 citations73
US4971651ANov 20, 1990
Microwave plasma processing method and apparatus
HITACHI LTD15 citations72