Inventor
JUN HWICHAN
US21 patents
⚠️ This page may combine multiple inventors who share the name “JUN HWICHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
19 patentsUS11670677B2Jun 6, 2023
Crossing multi-stack nanosheet structure and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD6 citations85
US11538814B2Dec 27, 2022
Static random access memory of 3D stacked devices
SAMSUNG ELECTRONICS CO LTD7 citations85
US10043800B2Aug 7, 2018
Integrated circuit device with gate line crossing fin-type active region
SAMSUNG ELECTRONICS CO LTD10 citations83
US11735585B2Aug 22, 2023
Stacked semiconductor device having mirror-symmetric pattern
SAMSUNG ELECTRONICS CO LTD2 citations73
US11502167B2Nov 15, 2022
Semiconductor device having stepped multi-stack transistor structure
SAMSUNG ELECTRONICS CO LTD4 citations73
US10522537B2Dec 31, 2019
Integrated circuit device
SAMSUNG ELECTRONICS CO LTD3 citations72
US10964791B2Mar 30, 2021
Semiconductor device having silicides and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD5 citations71
US10199471B2Feb 5, 2019
Semiconductor device with field effect transistors and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD5 citations69
US12087815B2Sep 10, 2024
Crossing multi-stack nanosheet structure and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US12057448B2Aug 6, 2024
Stacked semiconductor device having mirror-symmetric pattern
SAMSUNG ELECTRONICS CO LTD0 citations62
US11968818B2Apr 23, 2024
SRAM memory cell for stacked transistors with different channel width
SAMSUNG ELECTRONICS CO LTD0 citations62
US11935922B2Mar 19, 2024
Semiconductor device having stepped multi-stack transistor structure
SAMSUNG ELECTRONICS CO LTD0 citations62
US11742345B2Aug 29, 2023
Method of forming an array of multi-stack nanosheet structures having a dam structure isolating multi-stack transistors
SAMSUNG ELECTRONICS CO LTD0 citations62
US11437369B2Sep 6, 2022
Array of multi-stack nanosheet structures
SAMSUNG ELECTRONICS CO LTD0 citations62
US11538913B2Dec 27, 2022
Semiconductor device having silicides and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US10453838B2Oct 22, 2019
Semiconductor device
SAMSUNG ELECTRONICS CO LTD1 citations60
US11133392B2Sep 28, 2021
Semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations58
US11569232B2Jan 31, 2023
Semiconductor device including self-aligned gate structure and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US10636785B2Apr 28, 2020
Semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations50