Inventor

SUWA KYOICHI

JP39 patents

⚠️ This page may combine multiple inventors who share the name “SUWA KYOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SUWA KYOICHI

NIPPON KOGAKU KK

Focusing apparatus for projection optical system

Exposure apparatus for production of integrated circuit

Projection exposure apparatus

Exposure method and system for photolithography

Alignment apparatus

Automatic magnification correcting system in a projection optical apparatus

Photomask and exposure apparatus using the same

Alignment device in an IC projection exposure apparatus

Method and apparatus for detecting diversion

Projection optical apparatus

Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween

Method of aligning a semiconductor substrate and a photomask

Double-conjugate maintaining optical system

Positioning method

Positioning apparatus

Alignment apparatus

Apparatus for detecting position of an object such as a semiconductor wafer

NIKON CORP

Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision

Distortion inspecting method for projection optical system

Projection exposure apparatus

Wafer inspection method and apparatus using diffracted light

Imaging characteristic and asymetric abrerration measurement of projection optical system

Method for use of a critical dimensional test structure

Precision stage interferometer system with local single air duct

Atomic force microscope measurement process for dense photoresist patterns

Measuring method and exposure apparatus

Exposure condition measurement method

Projection exposure apparatus

Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices

Projection-exposing apparatus

Exposure method

Optical system, optical apparatus, imaging apparatus, and method for manufacturing optical system and imaging apparatus

NIKON PRECISION INC

Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus

Method for forming a critical dimension test structure and its use

Direct reticle to wafer alignment using fluorescence for integrated circuit lithography

Technique for detecting particles on a wafer support surface

Method and apparatus for determining performance characteristics in lithographic tools

NIKON PREC INC

Projection exposure apparatus and method with workpiece area detection

Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing