Inventor

LIN KUAN-WEN

TW20 patents

⚠️ This page may combine multiple inventors who share the name “LIN KUAN-WEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN KUAN-WEN

TAIWAN SEMICONDUCTOR MFG CO LTD

Mask pellicle indicator for haze prevention

Particle removing assembly and method of cleaning mask for lithography

Particle removing assembly and method of cleaning mask for lithography

Method and device for cleaning substrates

Lithography system and method for haze elimination

Acoustic measurement of fabrication equipment clearance

Acoustic measurement of fabrication equipment clearance

Particle removing assembly and method of cleaning mask for lithography

System and method for localized EUV pellicle glue removal

System and method for localized EUV pellicle glue removal

Method and device for cleaning substrates

Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors

Acoustic measurement of film thickness

Acoustic measurement of fabrication equipment clearance

Systems and methods of EUV mask cleaning

Systems and methods of EUV mask cleaning

Method and system for EUV mask cleaning with non-thermal solution

Damage prevention on EUV mask

TAIWAN SEMICONDUCTOR MFG

Device manufacturing and cleaning method

LU CHI-LUN

Device manufacturing and cleaning method