Inventor
DIETZE UWE
US13 patents
⚠️ This page may combine multiple inventors who share the name “DIETZE UWE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG
8 patentsUS10265739B2Apr 23, 2019
Method and apparatus for treating substrates
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG1 citations58
US11090693B2Aug 17, 2021
Device for applying to a substrate a liquid medium that has been charged with UV radiation
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG1 citations56
US11410858B2Aug 9, 2022
Device for applying to a substrate a liquid medium which is exposed to UV radiation
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG0 citations45
US11130158B2Sep 28, 2021
Device for applying a liquid medium which is exposed to UV radiation to a substrate
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG0 citations45
US11358172B2Jun 14, 2022
Method for treating substrates with an aqueous liquid medium exposed to UV-radiation
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG0 citations44
US10898932B2Jan 26, 2021
Method and apparatus for cleaning a substrate and computer program product
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG0 citations41
US10843235B2Nov 24, 2020
Device for applying a liquid medium which is exposed to UV radiation to a substrate
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG0 citations29
US10845718B2Nov 24, 2020
Holder for holding and for protecting a side of a photomask or a photomask or a photomask having pellicle from a cleaning medium, method for cleaning a photomask or a photomask with pellicle and device for opening and closing a holder
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG0 citations25
STEAG HAMATECH AG
2 patentsSUSS MIRCROTEC PHOTOMASK EQUIPMENT GMBH & CO KG
2 patentsUS10722925B2Jul 28, 2020
Treatment head, treatment system and method for treating a local surface area of a substrate
SUSS MIRCROTEC PHOTOMASK EQUIPMENT GMBH & CO KG1 citations51
US10416575B2Sep 17, 2019
Apparatus and method for cleaning a partial area of a substrate
SUSS MIRCROTEC PHOTOMASK EQUIPMENT GMBH & CO KG0 citations28