Inventor
TAKENAKA TSUTOMU
JP19 patents
⚠️ This page may combine multiple inventors who share the name “TAKENAKA TSUTOMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AGILENT TECHNOLOGIES INC
9 patentsUS6872903B2Mar 29, 2005
Surface joined multi-substrate liquid metal switching device
AGILENT TECHNOLOGIES INC12 citations84
US6806431B2Oct 19, 2004
Liquid metal micro-relay with suspended heaters and multilayer wiring
AGILENT TECHNOLOGIES INC14 citations84
US6756552B2Jun 29, 2004
Multi-pole conductive liquid-based switch device
AGILENT TECHNOLOGIES INC16 citations84
US6407401B1Jun 18, 2002
Photoconductive relay and method of making same
AGILENT TECHNOLOGIES INC10 citations74
US6614214B2Sep 2, 2003
Sampling element controlled by photoconductive switch-generated sampling pulses and sampling device incorporating same
AGILENT TECHNOLOGIES INC10 citations71
US6586269B2Jul 1, 2003
Photo-conductive relay and method of making same
AGILENT TECHNOLOGIES INC4 citations63
US6927350B2Aug 9, 2005
Multi-substrate liquid metal high-frequency switching device
AGILENT TECHNOLOGIES INC6 citations62
US6674934B2Jan 6, 2004
Pressure-actuated bi-stable optical switching
AGILENT TECHNOLOGIES INC6 citations62
US6317017B1Nov 13, 2001
Resonator having a variable resonance frequency
AGILENT TECHNOLOGIES INC3 citations62
TAKENAKA TSUTOMU
3 patentsUS8472009B2Jun 25, 2013
Exposure apparatus and device manufacturing method
TAKENAKA TSUTOMU10 citations81
US9348241B2May 24, 2016
Exposure apparatus and device manufacturing method
TAKENAKA TSUTOMU0 citations39
US8665416B2Mar 4, 2014
Exposure apparatus and method of manufacturing device
TAKENAKA TSUTOMU0 citations39
CANON KK
3 patentsUS9400434B2Jul 26, 2016
Exposure apparatus, exposure method, and device manufacturing method
CANON KK2 citations62
US7791707B2Sep 7, 2010
Exposure apparatus, exposure method, and device manufacturing method
CANON KK0 citations41
US7348107B2Mar 25, 2008
Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method
CANON KK0 citations41