Inventor
DOH IN-HOI
KR2 patents
Patents
2 patentsUS7311857B2Dec 25, 2007
Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device
SAMSUNG ELECTRONICS CO LTD13 citations81
US7183192B2Feb 27, 2007
Composition for removing photoresist and method of forming a bump electrode in a semiconductor device using the composition
SAMSUNG ELECTRONICS CO LTD7 citations71