Inventor

TSUJITA KOUICHIROU

JP31 patents

⚠️ This page may combine multiple inventors who share the name “TSUJITA KOUICHIROU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TSUJITA KOUICHIROU

MITSUBISHI ELECTRIC CORP

Manufacturing method of semiconductor device

Semiconductor device and method of manufacturing the same

Semiconductor substrate provided with marks for alignment even under a resist film

Phase shift mask, blank for phase shift mask, and method of manufacturing phase shift mask

Pattern determination method

Resist patterning method

Anti-reflection film and method of manufacturing

Method of forming a fine resist pattern of high resolution using a contrast enhancement layer

Method of manufacturing semiconductor device

Antireflection coating and semiconductor device manufacturing method

CANON KK

Pattern forming method and article manufacturing method

Method of transferring pattern of reticle, computer readable storage medium, and method of manufacturing device

Parameter determination method, exposure method, device fabrication method, and storage medium

Drawing method and method of manufacturing article

Exposure method and memory medium storing computer program

TSUJITA KOUICHIROU

Method for determining exposure condition and computer-readable storage media storing program for determining exposure condition

Recording medium storing program for determining exposure parameter, exposure method, and method of manufacturing device

Method for determining exposure condition and computer-readable storage media storing program for determining exposure condition

Exposure method

Recording medium and determination method

RENESAS TECH CORP

Method of manufacturing semiconductor device

Method of manufacturing electronic device

Method of manufacturing semiconductor device

Method of manufacturing a thinned gate electrode utilizing protective films and etching

GYODA YUICHI

Determination method, storage medium and information processing apparatus

Non-transitory computer-readable storage medium, decision method and computer for deciding exposure condition using evaluation item of interest and auxiliary evaluation item

Exposure method and storage medium

ISHII HIROYUKI

Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method

Storage medium storing computer program for determining at least one of exposure condition and mask pattern

YOSHII HIROTO

Effective light source shape database generation method, optical image calculation method, recording medium, exposure method, and device fabrication method

NAKAYAMA RYO

Resist pattern calculation method and calculation program storage medium